Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Yvo Barnscheidt"'
Autor:
Yuping Liu, Shuangying Ma, Marina Rosebrock, Pascal Rusch, Yvo Barnscheidt, Chuanqiang Wu, Pengfei Nan, Frederik Bettels, Zhihua Lin, Taoran Li, Binghui Ge, Nadja C. Bigall, Herbert Pfnür, Fei Ding, Chaofeng Zhang, Lin Zhang
Publikováno v:
Advanced Science, Vol 9, Iss 11, Pp n/a-n/a (2022)
Abstract Room‐temperature sodium–sulfur (RT Na–S) batteries are arousing great interest in recent years. Their practical applications, however, are hindered by several intrinsic problems, such as the sluggish kinetic, shuttle effect, and the in
Externí odkaz:
https://doaj.org/article/36d7ca4b86b54591b8bbb7bf1fcf55b2
Autor:
Yuping Liu, Yvo Barnscheidt, Manhua Peng, Frederik Bettels, Taoran Li, Tao He, Fei Ding, Lin Zhang
Publikováno v:
Advanced Science, Vol 8, Iss 14, Pp n/a-n/a (2021)
Abstract Lithium‐sulfur (Li‐S) batteries, as part of the post‐lithium‐ion batteries (post‐LIBs), are expected to deliver significantly higher energy densities. Their power densities, however, are today considerably worse than that of the LI
Externí odkaz:
https://doaj.org/article/798bcac0bad24a19971e49ec798e6302
Autor:
Yvo Barnscheidt, H. Joerg Osten
Publikováno v:
ECS Transactions. 93:67-70
Publikováno v:
Journal of Applied Crystallography
Journal of Applied Crystallography 53 (2020)
Journal of Applied Crystallography 53 (2020)
Grazing-incidence X-ray diffraction analysis of the coincidence site lattice formed by interfacial misfit dislocations in Ge/Si(001) heteroepitaxy is reported for a wide variety of Ge layer thicknesses ranging from 10 to 580 nm.
The Ge/Si(001) s
The Ge/Si(001) s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e316f5dd2c935c528e40e616a41a6465
Publikováno v:
Journal of Applied Physics. 128:095703
Epitaxial Ge films were grown on Si(001) substrates by molecular beam epitaxy. During epitaxial growth, two carbon interlayers were deposited at varying substrate temperatures ( 140 − 620 ° C) and with varying C quantity ( 0 − 1.5 monolayers). T
Autor:
Yevgeniya Larionova, Jan-Dirk Kähler, Sina Reiter, D. Tetzlaff, Yvo Barnscheidt, Tobias Wietler, Uwe Hohne, Jan Krügener, Robby Peibst, Mircea Turcu
Publikováno v:
2016 21st International Conference on Ion Implantation Technology (IIT).
Passivating junctions, like hole-collecting p+-polycrystalline silicon/SiOx/crystalline silicon junctions, need a thermal treatment to activate their excellent passivation and contact properties. Aside from surface passivation and from contact resist
Publikováno v:
Semiconductor Science and Technology. 33:104006