Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Yves Arnal"'
Publikováno v:
Surface and Coatings Technology. 186:170-176
The use of distributed electron cyclotron resonance (DECR) plasma sources for plasma-based ion implantation (PBII) presents limitations in terms of plasma density, limited to the critical density, and of uniformity, due to the difficulty of achieving
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a41f10d3403d24703ad9a909c1b99a3e
https://doi.org/10.1016/j.surfcoat.2004.04.036
https://doi.org/10.1016/j.surfcoat.2004.04.036
Publikováno v:
Review of Scientific Instruments. 75:1750-1753
We have used the existing magnetic multicusp configuration of the large volume H− source Camembert III to confine the plasma created by seven elementary multidipolar electron cyclotron resonance (ECR) sources, operating at 2.45 GHz. We varied the p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ab3a93654f7caa15d390326cd24a91e
https://doi.org/10.1063/1.1695619
https://doi.org/10.1063/1.1695619
Publikováno v:
Plasma Sources Science and Technology. 11:407-412
The scaling up of conventional distributed electron cyclotron resonance plasmas presents limitations in terms of plasma density, limited to the critical density, and of uniformity, due to the difficulty of achieving constant amplitude standing wave p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::188031cb951d90f8b2fb8008427fffd4
https://doi.org/10.1088/0963-0252/11/4/307
https://doi.org/10.1088/0963-0252/11/4/307
Publikováno v:
Surface and Coatings Technology. 139:222-232
After a brief review of the plasma production and diffusion mechanisms above multipolar magnetic field structures, the possible means of sustaining magnetron discharges are listed. In particular, various designs of distributed electron cyclotron reso
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c1ede6c3848efb396906f6b42541ac2
https://doi.org/10.1016/s0257-8972(01)01020-9
https://doi.org/10.1016/s0257-8972(01)01020-9
Publikováno v:
Plasma Sources Science and Technology. 10:181-190
In order to better understand the mechanisms of plasma production above multipolar magnetic fields via electron cyclotron resonance, the electron energy distribution function (EEDF) of an argon plasma in the magnetic field of a planar magnetron-like
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e95cd52ef4a0aca6b8a4e0926d59148e
https://doi.org/10.1088/0963-0252/10/2/308
https://doi.org/10.1088/0963-0252/10/2/308
Publikováno v:
Surface and Coatings Technology. 136:7-15
The two general specifications required for plasma-based ion implantation are low pressure large size plasmas and high voltage high current pulse generators. Due to the wide ion sheath expansion (up to a few tens of cm), large volumes of plasma are m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0397a47c10d19e50d69adce0ce793c35
https://doi.org/10.1016/s0257-8972(00)01001-x
https://doi.org/10.1016/s0257-8972(00)01001-x
Publikováno v:
Surface and Coatings Technology. 135:268-273
Processing of dielectric layers using a plasma-based ion implantation (PBII) technique has general implications in terms of plasma specifications and pulse characteristics. In particular, the different aspects of the processing of dielectric layers a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::334358edfd255bd04c40c1ac854905a2
https://doi.org/10.1016/s0257-8972(00)00993-2
https://doi.org/10.1016/s0257-8972(00)00993-2
Publikováno v:
Le Journal de Physique IV. :Pr7-121
Dans les sources plasma a resonance cyclotronique electronique repartie (RECR), l'acceleration des electrons est produite par un champ electrique microonde, applique et reparti sur des structures magnetiques multipolaires, capables de fournir le long
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02ea87af37887013aac057b60ed7df7d
https://doi.org/10.1051/jp4:1998710
https://doi.org/10.1051/jp4:1998710
Publikováno v:
Review of Scientific Instruments. 69:831-836
Plasma-based ion implantation (PBII) is a recent method to implant ions into materials for modifying surface properties. Negative high voltage pulses are applied to the substrate to extract ions from the plasma and accelerate them directly onto the s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::063651fbd54a887d3a9661191ea7a2bf
https://doi.org/10.1063/1.1148530
https://doi.org/10.1063/1.1148530
Publikováno v:
Surface and Coatings Technology. 93:265-268
For over a decade, our group has been working on the development of distributed electron cyclotron resonance (DECR) plasma sources. The uniform distributed plasma (UDP) is the latest outgrowth of DECR, which has proved to be a flexible concept, leadi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5daa1cba377d31189207c01abcbf0301
https://doi.org/10.1016/s0257-8972(97)00058-3
https://doi.org/10.1016/s0257-8972(97)00058-3