Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Yuval Blumberg"'
Publikováno v:
SPIE Proceedings.
The industry roadmap for IC manufacturing at design rules of 90nm and below foresees low k1-factor optical lithography at 193nm exposure wavelength. Aggressive model-based OPC are being used more and more frequently in order to achieve the extremely
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::537b0650587c6220d29952bd496a72a3
https://doi.org/10.1117/12.517815
https://doi.org/10.1117/12.517815
Autor:
Yuval Blumberg, Hong-Chang Hsieh, Anja Rosenbusch, Reuven Falah, Luke T. H. Hsu, Johnson Chang-Cheng Hung
Publikováno v:
SPIE Proceedings.
Inspection of aggressive OPC represents one of the major challenges for today's mask inspection methodologies. Systems are phased with high-density layouts, containing OPC features far below the resolution limit of conventional inspection systems. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28144cb711aa7a9267b01480fe9b4784
https://doi.org/10.1117/12.504058
https://doi.org/10.1117/12.504058