Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Yuval Bloomberg"'
Publikováno v:
SPIE Proceedings.
The paper presents the results of a study to define a production-worthy inspection technique for subresolution solid and hollow scattering features used in 193-nm lithography. Masks are inspected using conventional high-NA and aerial-imaging-based ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d1792c44790cc75890c4cd072b29496
https://doi.org/10.1117/12.579749
https://doi.org/10.1117/12.579749
