Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Yuuji Kobayashi"'
Autor:
Seiichi Yoshikawa, Daiki Natsui, Syunsuke Nojiri, Takayuki Watanabe, Keisuke Morita, Masashi Takatsuna, Yuuji Kobayashi, Tsutomu Miura, Manabu Takeuchi
Publikováno v:
Annals of Oncology. 33:S516
Publikováno v:
Food Science and Technology Research. 10:35-37
The solubilization of cattle achilles tendon with actinidin was investigated under neutral and acidic conditions. 1.43 to 1.92 and 0.97 to 3.19% of collagen were solubilized by treating the cattle achilles tendon with actinidin at 20°C at pH 6.0 and
Publikováno v:
International Journal of Electrical Power & Energy Systems. 15:5-12
This paper proposes a new type of filter, that is, a dominant mode filter (DMF) which uses the rotor speed fluctuations for dynamic security assessment and stability enhancement of power systems. The proposed filter can be used in detecting the degra
Publikováno v:
Oral Radiology. 7:7-11
Summary-Proton NMR spectra of gustatory stimulated healthy human whole, parotid and submandibular and sublingual saliva were measured. The typical patterns of their spectra were obtained. Among these three kinds of fluids the parotid saliva which con
Autor:
Takashi Hirano, Kenji Kawano, Seiro Miyoshi, Hiromitsu Mashita, Shinji Yamaguchi, Yuuji Kobayashi, Kohji Hashimoto, Hidefumi Mukai
Publikováno v:
SPIE Proceedings.
We have studied both the mask CD specification and the mask defect specification for spacer patterning technology (SPT). SPT has the possibility of extending optical lithography to below 40nm half-pitch devices. Since SPT necessitates somewhat more c
Publikováno v:
SPIE Proceedings.
We made a new model for the pattern failure, which was the pattern collapse and the pattern bridging, of the resist patterns of 43nm 1:1 lines and spaces (L/S) exposed as a focus-exposure matrix, in order to explain and predict the process window of
Autor:
Shinji Yamaguchi, Yuuji Kobayashi, Hidefumi Mukai, Ayumi Kobiki, Soichi Inoue, Takashi Hirano, Hiromitsu Mashita, Seiro Miyoshi, Kohji Hashimoto
Publikováno v:
Photomask Technology 2008.
We studied the mask defect printability for both opaque and clear defects in the spacer patterning process. The spacer patterning process consists of the development of photoresist film, the etching of the core film using the photoresist pattern as t
Publikováno v:
SPIE Proceedings.
A spacer patterning technology (SP) has the possibility of extending optical lithography to below 40nm half-pitch devices. Since the spacer patterning process necessitates somewhat more complicated wafer process flow, the CD variation on wafers invol
Publikováno v:
IEEJ Transactions on Power and Energy. 110:1043-1048