Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Yuuichi KOKAKU"'
Publikováno v:
International Journal of Modern Physics B. 14:125-135
A new type of unbalanced magnetic field for planer magnetron cathode was applied to conduct PE-CVD by the assistance of dc magnetron discharge. A carbon thin carbon was formed on a negatively biased substrated by supplying Ar and CH4. This coating wa
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:1162-1165
Amorphous hydrogenated carbon films have splendid wear characteristics as protective coatings. In the present work we have studied the relation between wear durability and microstructure of the amorphous hydrogenated carbon films prepared with radio
Publikováno v:
Japanese Journal of Applied Physics. 36:2817
We developed a radio-frequency-plasma-enhanced chemical vapor deposition (CVD) method with a positively self-biased electrode system. This method enables simultaneous ion-assisted deposition on both sides of a vertically suspended substrate at a grou
Autor:
Nagamitsu YOSHIMURA, Manami FUJIMOTO, Yasuhiro MATSUSHIMA, Toshio URANO, Toru KANAJI, Fuminori FUJIMOTO, Norio OGIWARA, Masaki MAENO, Shoji NOSHIROYA, Fumio KIMIJIMA, Yoji YOSHINARI, Hideaki ISOGAI, Masahiro HIRATA, Masatoshi ONO, Isao KUDO, Kiyohide KOKUBUN, Shingo ICHIMURA, Hiroko HASHIZUME, Hajime SHIMIZU, Yoshiro OOWADANO, Yuji MATSUMOTO, Hirotsugu TANAKA, Ryohei AIDA, Atsushi NAGATA, Haruo HIRANO, Yukihito KONDO, Junji FUKUHARA, Saburo SHIMIZU, Hiroyuki YAMAKAWA, Hiroshi MURAKAMI, Hazime SHIMIZU, Yukio ISHIBE, Hideki KOKAI, Hitoshi Oyama, Shigeki KATO, Yuichi Sakanoto, Tetsu MIENO, Rikizo HATAKEYAMA, Noriyoshi SATO, Nobuaki NODA, Tohru MIZUUCHI, Kenya AKAISHI, Osamu MOTOJIMA, Atsuo IIYOSHI, Kohji UO, Tadao HATAKEYAMA, Daisuke AONUMA, Seishi HORIGUCHI, Yoshihiro HIROTA, Naokichi HOSOKAWA, Shigeru BABA, Akira KINBARA, Koji OKAMOTO, Masayasu TANJYO, Eiji KAMIJO, Yoshitaka SETOGUCHI, Takahiro NAKAHIGASHI, Susumu AMEMIYA, Masahiro ASANO, Yukio TSURITA, Toshio MASUDA, Akihiro KANEUCHI, Toshio KATOH, Yuuichi KOKAKU, Makoto KITO, Masaie TOKAI, Hiroshi YANAGIDA, Takeshi KATAGAWA, Osamu TSUKAKOSHI, Souji KOMIYA, Takeo ICHINOKAWA
Publikováno v:
SHINKU. 31:602-613
Publikováno v:
Scopus-Elsevier
The deposition process of carbon coating by plasma CVD was studied for the development of a high-density magnetic disk with an ultra thin overcoat of about 4nm thickness. A hot filament discharge system was installed to disk production equipment for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5dfa91c8eb930bbee23e3078c7ce93b1
http://www.scopus.com/inward/record.url?eid=2-s2.0-0037139052&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0037139052&partnerID=MN8TOARS