Výsledky vyhledávání - "Yutaro Iwashige"

Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool

Autor: Yutaro Iwashige, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa

Publikováno v: Journal of Photopolymer Science and Technology. 35:41-47

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7a33c09d03aa1197a9f6f2627b9f3be4
https://doi.org/10.2494/photopolymer.35.41

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Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Autor: Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Publikováno v: Japanese Journal of Applied Physics. 62:036502

For the advancement of lithography, the resist materials and processes are the most critical factors. In particular, the process of developing resist materials is important in reducing the line width roughness and stochastic defects. In this study, a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::de1f62bf410a4f074aab4ecbc6b92377
https://doi.org/10.35848/1347-4065/acbcb6

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