Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Yutao Gui"'
Autor:
Jenny Yueh, Miguel Garcia Granda, Seung-Bin Yang, Seung Yoon Lee, Elliott McNamara, Ewoud van West, Bart Segers, Yoon-Tae Lee, Se-Ra Jeon, Ali Ghavami, Yutao Gui, Joon-Soo Park, Daniel Park, Koshiba Dakeshi, Frank Staals, Jeongjin Lee, Chan Hwang, Inbeom Yim, Se-Hui Lee, Eric Janda
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
In order to meet the tightened lithography performance requirement for EUV systems, a good on-product focus control with accurate metrology is essential. In this manuscript we report on a novel metrology solution for the EUV on-product focus measurem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c15bb826d524b92a922ae00f30542136
https://doi.org/10.1117/12.2553246
https://doi.org/10.1117/12.2553246
