Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Yutaka Hojyo"'
Autor:
Yutaka Hojyo, Atsushi Miyamoto
Publikováno v:
Measurement Science and Technology. 27:025407
Semiconductor manufacturing has a pressing need for a method to accurately evaluate the global shape deformation of a photomask pattern. We thus propose a novel composition technique for a large field panorama image of scanning electron microscopy (S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75a56fef728d96e8c45c293dca584517
https://doi.org/10.1088/0957-0233/27/2/025407
https://doi.org/10.1088/0957-0233/27/2/025407
Publikováno v:
SPIE Proceedings.
OPC model calibration techniques that use SEM contours are a major reason for the modern day improved fitting efficiency in complex mask design compared to conventional CD-based calibration. However, contour-based calibration has a high computational
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c133c99772b4753490357e17b5480809
https://doi.org/10.1117/12.913957
https://doi.org/10.1117/12.913957
Autor:
Thuy Do, John L. Sturtevant, Daisuke Hibino, Yutaka Hojyo, Hiroyuki Shindo, Ir Kusunadi, Daisuke Fuchimoto
Publikováno v:
SPIE Proceedings.
OPC modeling has been complex procedure in 28nm node, and it becomes difficult to obtain enough OPC modeling accuracy if calibration is done by using only CD value. Therefore it becomes essential to take pattern shape variation into consideration esp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba21180686d0e75f7faee997bee4100a
https://doi.org/10.1117/12.916593
https://doi.org/10.1117/12.916593
Autor:
Yutaka Hojyo, Tim Lin, Aasutosh Dave, Thuy Do, Hiroyuki Shindo, John L. Sturtevant, Daisuke Hibino, Ir Kusnadi
Publikováno v:
SPIE Proceedings.
As design rules shrink, Optical Proximity Correction (OPC) becomes complicated. As a result, measurement points have increased, and improving the OPC model quality has become more difficult. From the viewpoint of decreasing OPC calibration runtime an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::286781fc19342b4a3d03ac3f020cfe17
https://doi.org/10.1117/12.879030
https://doi.org/10.1117/12.879030
Autor:
Takuma Shibahara, Tsuyoshi Minakawa, Hiroyuki Shindo, Michio Oikawa, Yutaka Hojyo, Hitoshi Sugahara
Publikováno v:
SPIE Proceedings.
Recently, optical proximity correction model calibration techniques that use SEM contours have enabled possibly significant improvements in complex mask design. However, compared to conventional CD-based calibration, contour-based calibration results
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa834c726e8cf659637308ea8ee81bb5
https://doi.org/10.1117/12.878583
https://doi.org/10.1117/12.878583
Autor:
Ir Kusnadi, Hiroyuki Shindo, Thuy Do, Daisuke Hibino, Yuichi Abe, Jeroen Van de Kerkhove, Germain Fenger, Yutaka Hojyo, John L. Sturtevant, Peter De Bisschop
Publikováno v:
SPIE Proceedings.
OPC-modeling is traditionally based on CD-measurements. As design rules shrink, and process window become smaller, there is an unavoidable increase in the complexity of OPC/RET schemes required to enable design printability. The number of measurement
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31820c59a35a4a05fd419c50bb76d358
https://doi.org/10.1117/12.846025
https://doi.org/10.1117/12.846025
Autor:
Yuichi Kawase, Koki Kuriyama, Toshio Suzuki, Yutaka Hojyo, Morihisa Hoga, Shinji Sakamoto, Junji Hirumi, Syogo Narukawa
Publikováno v:
SPIE Proceedings.
We have developed a unified mask data format named “OASIS.VSB” for Variable-Shaped-Beam (VSB) EB writers. OASIS.VSB is the mask data format based on OASIS released as a successive format to GDSII by SEMI. We have defined restrictions on OASIS for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd9f02bac68b6ae156769e1f99dfa900
https://doi.org/10.1117/12.617423
https://doi.org/10.1117/12.617423
Autor:
Shinji Sakamoto, Yutaka Hojyo, Koki Kuriyama, Morihisa Houga, Syogo Narukawa, Nobuyuki Yoshioka, Toshio Suzuki, Junji Hirumi, Yuichi Kawase
Publikováno v:
SPIE Proceedings.
We have developed a unified mask data format named “OASIS.NEO 1 ” for Variable-Shaped-Beam (VSB) EB writers as enhancement of unified mask data format named “NEO 2 ”. OASIS.NEO is a pattern data format based on OASIS TM3 released as GDSII rep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f70b3409ccb1e308d9b8569591383ff2
https://doi.org/10.1117/12.579130
https://doi.org/10.1117/12.579130
Autor:
Shigehiro Hara, Yuichi Kawase, Morihisa Hoga, Hidemichi Kawase, Junji Hirumi, Toshio Suzuki, Kokoro Kato, Koki Kuriyama, Satoshi W. Watanabe, Tomoko Kamimoto, Nobuyuki Yoshioka, Yutaka Hojyo
Publikováno v:
SPIE Proceedings.
Mask data preparation (MDP) is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have developed unified mask data formats for Vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::882539e4a29bffdd66e22f3bc8cfa1cb
https://doi.org/10.1117/12.557738
https://doi.org/10.1117/12.557738
Autor:
Thuy Do, Yuichi Abe, Ir Kusnadi, Peter De Bisschop, Jeroen Van de Kerkhove, Daisuke Hibino, John L. Sturtevant, Germain Fenger, Hiroyuki Shindo, Yutaka Hojyo
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 10:013012
Optical proximity correction (OPC) modeling is traditionally based on critical dimension (CD) measurements. As design rules shrink and process windows become smaller, there is an unavoidable increase in the complexity of OPC resolution enhancement te
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef8beca05edb5cf77e13a04e5ed18a5e
https://doi.org/10.1117/1.3530082
https://doi.org/10.1117/1.3530082