Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Yuta, Ikari"'
Autor:
David C. Grenz, Youhei Takeda, Marli Ferreira, Satoshi Minakata, Takahito Kaihara, Norimitsu Tohnai, Birgit Esser, Shimpei Goto, Takumu Yoshida, Tomoyuki Ikai, Marcel Bovenkerk, Przemyslaw Data, Patrycja Stachelek, Yuta Ikari
Publikováno v:
Synthesis. 53:1584-1596
A new family of emissive donor–acceptor–donor (D-A-D) compounds has been developed by introducing two electron donors into the 7,8-diaza[5]helicene core as a novel helical electron acceptor. The X-ray crystallographic analyses revealed the unique
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b5d8cd937e04ce668054f5da29a1ad6
https://doi.org/10.1055/a-1343-5810
https://doi.org/10.1055/a-1343-5810
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
The photo-mask in lithographic process of semiconductor device has an important role to transfer the downsized target image to the wafer. Due to the development of information society, demand for semiconductor devices has been growing. In order to in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27fa29b4feff78f780d472bda2bb14fc
https://doi.org/10.1117/12.2551825
https://doi.org/10.1117/12.2551825
Autor:
Koki Ueno, Kazumasa Okamoto, Yuichi Inubushi, Takahiro Kozawa, Shunpei Kawai, Akira Kon, Hiroo Kinoshita, Shigeki Owada, Yuta Ikari, Thanh-Hung Dinh, Yohei Arai, Masahiko Ishino, Akihiro Konda, Masaharu Nishikino, Shigeo Hori
Publikováno v:
Applied Physics Express. 14:066502
Efforts are being focused on increasing the power of extreme ultraviolet (EUV) light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9effc818f8e5b6eaa00f2d4935e71be
https://doi.org/10.35848/1882-0786/abfca3
https://doi.org/10.35848/1882-0786/abfca3
Autor:
Kazumasa, Okamoto, Shunpei, Kawai, Yuta, Ikari, Shigeo, Hori, Akihiro, Konda, Koki, Ueno, Yohei, Arai, Masahiko, Ishino, Dinh, Thanhhung, Masaharu, Nishikino, Akira, Kon, Shigeki, Owada, Yuichi, Inubushi, Hiroo, Kinoshita, Takahiro, Kozawa
Publikováno v:
Applied Physics Express. 14:066502
Efforts are being focused on increasing the power of EUV light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a critical issue. A chemi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::4409df2361d3c0c2c3dfec59ddde7569
https://repo.qst.go.jp/records/82819
https://repo.qst.go.jp/records/82819
Publikováno v:
Japanese Journal of Applied Physics. 59:086506
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8699e4eff29d028460e8328c1aa99cc
https://doi.org/10.35848/1347-4065/aba7d7
https://doi.org/10.35848/1347-4065/aba7d7
Autor:
Yuta Ikari, Masakazu Nara
Publikováno v:
Palaeogeography, Palaeoclimatology, Palaeoecology. 305:250-255
Well-preserved specimens of the trace fossil Protovirgularia occur in deep sea trough fills of the Palaeogene accretionary complex of the Muroto-Hanto Group in southwestern Japan. The trace fossil, occurring characteristically on the sole of sandston
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c76384786dbcc84289dce916155bbdd8
https://doi.org/10.1016/j.palaeo.2011.03.005
https://doi.org/10.1016/j.palaeo.2011.03.005
Publikováno v:
The Journal of the Geological Society of Japan. 120:III-IV
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::707973be70c0c16efc227ad6a2103013
https://doi.org/10.5575/geosoc.2013.0057
https://doi.org/10.5575/geosoc.2013.0057