Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Yusuke Horiguchi"'
Publikováno v:
Osteoporotic Fracture and Systemic Skeletal Disorders ISBN: 9789811656125
Osteoporotic Fracture and Systemic Skeletal Disorders
Osteoporotic Fracture and Systemic Skeletal Disorders
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49d902d2b9b8f5ea289f7d9a3e80441e
https://doi.org/10.1007/978-981-16-5613-2_9
https://doi.org/10.1007/978-981-16-5613-2_9
Autor:
Yusuke Horiguchi
Publikováno v:
SSRN Electronic Journal.
The US government faces severe challenges in the midst of this raging pandemic. Overcoming the health crisis is priority number one. But protecting the minimum livelihoods of individuals and ensuring the survival of otherwise viable entities are of e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e959b7a959f1e404a466ccf7abf69628
https://doi.org/10.2139/ssrn.3599147
https://doi.org/10.2139/ssrn.3599147
Autor:
Yusuke Horiguchi
Publikováno v:
SSRN Electronic Journal.
One of the key concerns associated with large deficit spending is unfair debt burden to be born by future generations that such spending gives rise to. Massive pandemic relief spending financed by debt in the US in the past several months, as expecte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::663d8b75833b8ac4135f6519b6717547
https://doi.org/10.2139/ssrn.3686242
https://doi.org/10.2139/ssrn.3686242
Autor:
Michael W. Lin, Tomoya Ohashi, C. Grant Willson, Sangwoong Yoon, Yusuke Horiguchi, Yasuyuki Nakajima, Satoshi Takei
Publikováno v:
International Journal of Nanoscience. :103-106
This study focuses on the correlation between simulation and experiment using UV curable gap fill materials for global planarization in advanced lithographic and nanoimprinting techniques. A novel gap fill material has been optimized and developed fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f62c9deda115369e74c1613c038d9772
https://doi.org/10.1142/s0219581x09005840
https://doi.org/10.1142/s0219581x09005840
Publikováno v:
Japanese Journal of Applied Physics. 46:4074-4078
In the dual damascene (DD) process using the via-first trench-last approach, a planarizing thermally cured material is used to minimize thickness variation across the vias. The coating planarization is followed by photoresist application and lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d40e0669b99631f0291b1ad1d4aec32c
https://doi.org/10.1143/jjap.46.4074
https://doi.org/10.1143/jjap.46.4074
Autor:
Yusuke Horiguchi
Publikováno v:
SSRN Electronic Journal.
The collapse of Lehman in mid September 2008 was a momentous event. Yet whether Lehman really had to fail is an issue that has not received the kind of scrutiny it deserves. The reason for that seems to be the public statement made by then Treasury S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2533b42f817b9650bf894ad4b884cda
https://doi.org/10.2139/ssrn.2656517
https://doi.org/10.2139/ssrn.2656517
Autor:
Yusuke Horiguchi
Publikováno v:
SSRN Electronic Journal.
Against the background of the 2007-2009 financial crisis which years of conspicuous debt buildup set the stage for and the persistence of debt overhand since then, tax deductibility of debt interest has come under increased scrutiny. The prevailing v
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c64bc242a490ef324a09c2c24abceaa
https://doi.org/10.2139/ssrn.2656458
https://doi.org/10.2139/ssrn.2656458
Publikováno v:
Journal of Photopolymer Science and Technology. 17:645-650
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6be63a3df794801842f98965afa56811
https://doi.org/10.2494/photopolymer.17.645
https://doi.org/10.2494/photopolymer.17.645
Autor:
Yusuke Horiguchi, Hirokazu Kato, Eishi Shiobara, Satoshi Takei, Shinichi Ito, Tomoya Oori, Kentaro Matsunaga, Makoto Muramatsu, Takahiro Kitano, Tomoya Ohashi, Mitsuaki Iwashita
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
The lithography process on topographic substrate is one of the most critical issues for device manufacturing. Topographic substrate-induced focus variation occurs between top position and bottom position in a layer. That is, common depth of focus is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::882dabf25938c44b689b66a13136924e
https://doi.org/10.1117/12.813647
https://doi.org/10.1117/12.813647
Autor:
Katsuhiro Tsuchiya, Makoto Muramatsu, Mitsuaki Iwashita, Tomoya Ohashi, Yusuke Horiguchi, Satoshi Takei, Yuichi Mano, Tadayuki Yamaguchi, Yasuyuki Nakajima
Publikováno v:
SPIE Proceedings.
This study focuses on ultraviolet cross-link process using spin-coating materials for advanced planarization and sublimate defect reduction in the advanced process techniques of semiconductor, display, and new electronic devises. The ultraviolet cros
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a84295523c282be614b4f89e4f41684e
https://doi.org/10.1117/12.797401
https://doi.org/10.1117/12.797401