Zobrazeno 1 - 10 of 10 pro vyhledávání: '"Yusuke Ebata"'
1
Correlation between skin absorbance and skin burns caused by near-infrared laser irradiation in several mammalian species
Autor: Yuki Kawase, Yusuke Ebata, Naoya Ishibashi, Kei Tamura, Nanjo Takuya
Publikováno v: Optical Interactions with Tissue and Cells XXXII.
The purpose of this study is to obtain the relationship between skin absorbance, a rise in temperature on the skin surface, and skin burns in several mammalian species and to estimate burn risk in humans. We measured the skin absorbance of the specie
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f546322f412d07be25acfcf8eeaea57a
https://doi.org/10.1117/12.2577094
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2
High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells Using Very High Frequency Plasma at Atmospheric Pressure
Autor: Kiyoshi Yasutake, Mitsuhiro Matsumoto, Yasuhito Kuwahara, Kumayasu Yoshii, Yuzo Mori, Hiromasa Ohmi, Yusuke Ebata, Hiroaki Kakiuchi
Publikováno v: Japanese Journal of Applied Physics. 45:3587-3591
We have investigated the electrical and optical properties of hydrogenated amorphous silicon (a-Si:H) films prepared with extremely high deposition rates using very high frequency (VHF) plasma of gas mixtures containing He, H2, and SiH4 at atmospheri
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::41d24d4c40b6b656f900ab1bf1d92826
https://doi.org/10.1143/jjap.45.3587
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3
Characterization of intrinsic amorphous silicon layers for solar cells prepared at extremely high rates by atmospheric pressure plasma chemical vapor deposition
Autor: Yusuke Ebata, Kumayasu Yoshii, Hiromasa Ohmi, Yuzo Mori, Hiroaki Kakiuchi, Mitsuhiro Matsumoto, Kiyoshi Yasutake
Publikováno v: Journal of Non-Crystalline Solids. 351:741-747
Using the pressure plasma chemical vapor deposition (CVD) technique, extremely high-rate deposition of hydrogenated amorphous silicon (a-Si:H) films for photovoltaic layers of thin film solar cells was investigated. Amorphous Si:H films were deposite
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7f4e61f42ccffa7dc396bc5d6e29d9e3
https://doi.org/10.1016/j.jnoncrysol.2004.08.271
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4
Characterization of Polycrystalline Silicon Films Fabricated by Atmospheric Pressure Plasma CVD with Rotary Electrode
Autor: Yasuji Nakahama, Hiroaki Kakiuchi, Yusuke Ebata, Yuzo Mori, Kiyoshi Yasutake, Kumayasu Yoshii, Hiromasa Ohmi
Publikováno v: Journal of the Japan Society for Precision Engineering, Contributed Papers. 70:144-148
Polycrystalline silicon (poly-Si) films were fabricated with high deposition rate using the atmospheric pressure plasma CVD (AP-PCVD) technique. The films were prepared on thermal oxidized Si(001) wafers at 500 °C in atmospheric pressure VHF (very h
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5ac49e5bfb01c14d7a93dbd248a35b5f
https://doi.org/10.2493/jspe.70.144
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7
Ultrahigh-rate Deposition of Amorphous Silicon Films for Solar Cells by Atmospheric Pressure Plasma CVD
Autor: K. Yasutake, Kumayasu Yoshii, Hiroaki Kakiuchi, Yusuke Ebata, Yuzo Mori, Mitsuhiro Matsumoto
Publikováno v: Journal of the Japan Society for Precision Engineering. 68:1077-1081
Further investigations to improve the quality of the amorphous silicon (a-Si) films fabricated at extremely high deposition rate by atmospheric pressure plasma CVD were performed. The electrical and optical properties of the films were investigated w
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7446f6f89055fffe1ecc895eb60ddb21
https://doi.org/10.2493/jjspe.68.1077
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