Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Yusin Yang"'
Autor:
Jangryul Park, Youngsun Choi, Soonyang Kwon, Youngjun Lee, Jiwoong Kim, Jae-joon Kim, Jihye Lee, Jeongho Ahn, Hidong Kwak, Yusin Yang, Taeyong Jo, Myungjun Lee, Kwangrak Kim
Publikováno v:
Light: Science & Applications, Vol 13, Iss 1, Pp 1-14 (2024)
Abstract As semiconductor devices shrink and their manufacturing processes advance, accurately measuring in-cell critical dimensions (CD) becomes increasingly crucial. Traditional test element group (TEG) measurements are becoming inadequate for repr
Externí odkaz:
https://doaj.org/article/a25a851f4dcc4fcc9fe3ebbc71b740a3
Autor:
JunTaek Oh, Jaehyeon Son, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9fb3d0e596d0ccf7d2436f3966dbbcbe
https://doi.org/10.1117/12.2658131
https://doi.org/10.1117/12.2658131
Autor:
Jaehyeon Son, JunTaek Oh, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cdad0a4ce9fe2ccbe3099149423009df
https://doi.org/10.1117/12.2657414
https://doi.org/10.1117/12.2657414
A study on defect signal improvement using multi-scan optic patch images and new detection algorithm
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ea5fa00ee95a176d9c2b0cc765779f24
https://doi.org/10.1117/12.2657845
https://doi.org/10.1117/12.2657845
Autor:
Garam Choi, Jinyong Kim, Daehoon Han, Young-Uk Jin, Soonhong Hwang, Jinseob Kim, Wookrae Kim, Jaehwang Jung, Seungwoo Lee, Taejoong Kim, Jinwoo Ahn, Myungjun Lee, Gideok Kim, Su-Young Lee, Yusin Yang
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8acba1d2ea86c4ebaff87c2b64ec7b1c
https://doi.org/10.1117/12.2657852
https://doi.org/10.1117/12.2657852
Autor:
Sungyoon Ryu, Donghoon Kim, Sunhong Jun, Suho Ryu, JaeHyung Ahn, Hyun Lee, KwangEun Kim, Yusin Yang, Younghoon Sohn
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f258cddbb84ad95f774c56c93f3ff2d
https://doi.org/10.1117/12.2613631
https://doi.org/10.1117/12.2613631
Autor:
Hao Wang, Jiabei Zhu, Jangwoon Sung, Guorong Hu, Joseph Greene, Yunzhe Li, Seungbeom Park, Wookrae Kim, Myungjun Lee, Yusin Yang, Lei Tian
Publikováno v:
Optics Express. 31:11007
Topography measurement is essential for surface characterization, semiconductor metrology, and inspection applications. To date, performing high-throughput and accurate topography remains challenging due to the trade-off between field-of-view (FOV) a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::332223d57d618b359ed9c415d80667f2
https://doi.org/10.1364/oe.481712
https://doi.org/10.1364/oe.481712
Publikováno v:
Microscopy and Microanalysis. 28:800-801
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad845a4b3e0aeff08aaad145d25aff74
https://doi.org/10.1017/s1431927622003609
https://doi.org/10.1017/s1431927622003609
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-5, 5p
Autor:
Yasutsugu Usami, Suejin Cho, Mitsunori Numata, Yusin Yang, Yong-Deok Jeong, Mitsuhiro Togashi, Harutaka Sekiya
Publikováno v:
SPIE Proceedings.
The shrinking of design rule requires the short wavelength light used in the optical inspection system. However, the existence of the condition that the long wavelength light becomes effective for the defect detection in line/space structure is known
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f7ce1b1dfaae1fb8c5a5d84c33f0047
https://doi.org/10.1117/12.916267
https://doi.org/10.1117/12.916267