Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Yury Oshmyansky"'
Publikováno v:
Journal of Microelectromechanical Systems. 26:1132-1139
This paper presents the design, fabrication, and characterization of piezoelectric micromachined ultrasound transducers (PMUTs) based on scandium aluminum nitride (ScxAl1–xN) thin films (x = 15%). ScAlN thin film was prepared with a dual magnetron
Publikováno v:
2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS).
This paper presents a promising device design for Super High Frequency (SHF) Lateral Field Excitation Cross-sectional Lame Mode Resonators (LFE CLMRs). Advancements over the state-of-the-art are made possible by harnessing the full capabilities of 20
Autor:
Yury Oshmyansky, Sergey Mishin
Publikováno v:
2018 IEEE International Ultrasonics Symposium (IUS).
Recently, highly Sc doped aluminum nitride films have been used for variety of applications ranging from microphones to PMUT sensors. Deposition on different substrate surfaces such as Pt, Mo, W, Si, SiO2 and SiN (both patterned and un-patterned)lead
Autor:
Gianluca Piazza, Zachary Schaffer, Sergey Mishin, Abhay Kochhar, Luca Colombo, Yury Oshmyansky
Publikováno v:
2018 IEEE Micro Electro Mechanical Systems (MEMS).
This paper reports experimental investigation of damping factors for 20% Scandium-doped Aluminum Nitride (ScAlN) laterally vibrating resonators (LVRs). ScAlN films for LVRs are very promising since they enable greater electromechanical coupling (k t
Publikováno v:
2017 IEEE International Ultrasonics Symposium (IUS).
This paper reports on the investigation of 1 μm thick films of 20% Scandium-doped Aluminum Nitride (ScAlN) for the making of piezoelectric MEMS laterally vibrating resonators (LVRs). The ScAlN films, which can be sputter-deposited such as undoped Al
Autor:
Sergey Mishin, Yury Oshmyansky
Publikováno v:
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium (EFTF/IFC).
In the past, most BAW and FBAR filters were produced on 150mm wafers. Typical yield on 150mm wafers was > 90% [1], [2]. In the last few years, most filter manufacturers started migrating to 200mm wafers in order to reduce the cost of manufacturing. U
Autor:
Yury Oshmyansky, Sergey Mishin
Publikováno v:
2016 IEEE International Ultrasonics Symposium (IUS).
Most standard processes only require controlling average stress on the sputter deposited films.
Publikováno v:
2016 Solid-State, Actuators, and Microsystems Workshop Technical Digest.
Autor:
Yury Oshmyansky, Sergey Mishin
Publikováno v:
2016 IEEE International Frequency Control Symposium (IFCS).
FBAR (thin film bulk acoustic resonator) filters are widely used in making filters for wireless applications [1]. Until recently, most of the FBAR filters were manufactured on 150mm wafers. In the last couple of years, manufacturing of the FBAR devic
Autor:
Yury Oshmyansky, Sergey Mishin
Publikováno v:
2015 Joint Conference of the IEEE International Frequency Control Symposium & the European Frequency and Time Forum.
There have been several investigations [1], [2], [3], that demonstrated benefits of adding dopants such as (Sc) or combination of other materials, like Zr/Mg for example, to the aluminum nitride (AlN) films in order to increase coupling coefficient (