Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Yury K. Verevkin"'
Autor:
Ainara Rodriguez, Santiago M. Olaizola, Miguel Ellman, Mikel Echeverría, Changsi Peng, I. Ayerdi, Noemí Pérez, T. Berthou, Yury K. Verevkin, Zuobin Wang
Publikováno v:
Applied Surface Science. 255:5537-5541
High throughput and low cost fabrication techniques in the sub-micrometer scale are attractive for the industry. Laser interference lithography (LIL) is a promising technique that can produce one, two and three-dimensional periodical patterns over la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b07def3fff53f8ebf779024419d02d48
https://doi.org/10.1016/j.apsusc.2008.07.201
https://doi.org/10.1016/j.apsusc.2008.07.201
Autor:
Chunlei Tan, Yury K. Verevkin, Changsi Peng, Santiago M. Olaizola, Ze Ji, S Tisserand, Jin Zhang, T. Berthou, Zuobin Wang
Publikováno v:
2009 International Conference on Mechatronics and Automation.
This paper introduces the quality inspection of nanoscale patterns produced by the Laser Interference Lithography (LIL) technology using image analysis techniques. In this paper, patterns of two-beam and four-beam interferences are considered. Image
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8595ad0dfe50088b168c57924d7aa1f2
https://doi.org/10.1109/icma.2009.5246458
https://doi.org/10.1109/icma.2009.5246458
Autor:
Miguel Ellman, Noemí Pérez, Changsi Peng, Zuobin Wang, I. Ayerdi, Ainara Rodriguez, Ze Ji, Santiago M. Olaizola, Yury K. Verevkin, Jin Zhang, T. Berthou
Publikováno v:
SPIE Proceedings.
Laser interference lithography (LIL) is concerned with the use of interference patterns generated from two or several coherent beams of laser radiation for the structuring of materials. This paper presents the work on the processes based on resists a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0374117fb664505c338c2040d813405b
https://doi.org/10.1117/12.808834
https://doi.org/10.1117/12.808834
Autor:
Zuobin Wang, Changsi Peng, Yury K. Verevkin, T. Berthou, Chunlei Tan, Ainara Rodriguez, Jin Zhang, Santiago M. Olaizola, I. Ayerdi, S Tisserand
Publikováno v:
2007 International Conference on Mechatronics and Automation.
This paper presents a system requirement analysis of multi-beam laser interference nanolithography for nanoscale structuring of materials including seven sections: introduction, formation of multi-beam laser interference patterns, user requirements,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b31def65e08edcb8d52c1fd07180bf2
https://doi.org/10.1109/icma.2007.4303582
https://doi.org/10.1109/icma.2007.4303582
Autor:
Yury K. Verevkin, S. Z. Su, Chunlei Tan, Changsi Peng, Ainhara Rodríguez, Santiago M. Olaizola, S Tisserand, Thierry Berthoud
Publikováno v:
SPIE Proceedings.
Multi-beam laser interference lithography (MB-LIL) is a rapid and cost-effective maskless optical lithography technique to parallelly pattern periodic or quasi- periodic micro/nano-structured material over large areas more than square centimetres. An
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7cea8463b0579a77f5eeae6cd9d1c483
https://doi.org/10.1117/12.723620
https://doi.org/10.1117/12.723620
Autor:
Santiago M. Olaizola, Vladimir N. Petryakov, Alexsander Y. Klimov, Yury K. Verevkin, Boris Alexsandrovich Gribkov
Publikováno v:
SPIE Proceedings.
Nanoscale periodic and quasiperiodic relieves on fused quartz are of interest for the creation of a variety of optical and electronic devices such as phase masks, one- and two-dimensional stamps for nanoimprint and wide-band antireflection structures
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9f8e02e6943e3959dbf1217dcf3a56d
https://doi.org/10.1117/12.723776
https://doi.org/10.1117/12.723776
Autor:
S Tisserand, Yury K. Verevkin, Ze Ji, Zuobin Wang, Eric Y. Daume, Ainara Rodriguez, Santiago M. Olaizola, Changsi Peng, Chunlei Tan, Jin Zhang, T. Berthou
Publikováno v:
SPIE Proceedings.
This paper presents a theoretical analysis of formation of 4-beam laser interference patterns for nanolithography. Parameters of 4-beam interference patterns including the pattern amplitude, period, orientation and uniformity were discussed. Analytic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::421118607c4be9be08108239146adc85
https://doi.org/10.1117/12.723782
https://doi.org/10.1117/12.723782