Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Yuri Mankelevich"'
Autor:
Daniil Marinov, Jean-François de Marneffe, Quentin Smets, Goutham Arutchelvan, Kristof M. Bal, Ekaterina Voronina, Tatyana Rakhimova, Yuri Mankelevich, Salim El Kazzi, Ankit Nalin Mehta, Pieter-Jan Wyndaele, Markus Hartmut Heyne, Jianran Zhang, Patrick C. With, Sreetama Banerjee, Erik C. Neyts, Inge Asselberghs, Dennis Lin, Stefan De Gendt
Publikováno v:
npj 2D Materials and Applications, Vol 5, Iss 1, Pp 1-10 (2021)
Abstract The cleaning of two-dimensional (2D) materials is an essential step in the fabrication of future devices, leveraging their unique physical, optical, and chemical properties. Part of these emerging 2D materials are transition metal dichalcoge
Externí odkaz:
https://doaj.org/article/f7264bb1bbb04927a645eab375c746fc
Autor:
Yuri Mankelevich, Michael Ashfold
Publikováno v:
Ashfold, M N R & Mankelevich, Y A 2022, ' Self-consistent modeling of microwave activated N 2 /CH 4 /H 2 (and N 2 /H 2 ) plasmas relevant to diamond chemical vapour deposition ', Plasma Sources Science and Technology, vol. 31, no. 3, 035005 . https://doi.org/10.1088/1361-6595/ac409e
The growth rate of diamond by chemical vapor deposition (CVD) from microwave (MW) plasma activated CH4/H2 gas mixtures can be significantly enhanced by adding trace quantities of N2 to the process gas mixture. Reasons for this increase remain unclear
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::793755689a9e667829fd6b8a50efcc2d
https://hdl.handle.net/1983/2e4e0513-4a76-45e2-afce-0f747595dba6
https://hdl.handle.net/1983/2e4e0513-4a76-45e2-afce-0f747595dba6
Autor:
Pedro Viegas, Tiago Cunha Dias, Chloé Fromentin, Alexander Chukalovsky, Yuri Mankelevich, Olga Proshina, Tatyana Rakhimova, Vasco Guerra, Dmitry Voloshin
Publikováno v:
Plasma Sources Science and Technology. 32:024002
This work focuses on the comparison between a zero-dimensional (0D) global model (LoKI) and a one-dimensional (1D) radial fluid model for the positive column of oxygen DC glow discharges in a tube of 1 cm inner radius at pressures between 0.5 Torr an
Autor:
Ivanov, V. V., Klopovskii, K. S., Yuri Mankelevich, Rakhimov, A. T., Rakhimova, T. V., Rulev, G. B., Saenko, V. B.
Publikováno v:
ResearcherID
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::8a879bf59b24866398dafe43286d2f25
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:A1996VG28000002&KeyUID=WOS:A1996VG28000002
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:A1996VG28000002&KeyUID=WOS:A1996VG28000002
Publikováno v:
ResearcherID
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::947153767c7ae2be1eef891ef35b7bd1
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000081477400009&KeyUID=WOS:000081477400009
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000081477400009&KeyUID=WOS:000081477400009
Publikováno v:
Plasma Sources Science & Technology; Feb2016, Vol. 25 Issue 1, p1-1, 1p