Zobrazeno 1 - 10
of 44
pro vyhledávání: '"Yuntao Jiang"'
Publikováno v:
Polymers, Vol 14, Iss 13, p 2615 (2022)
The massive application of chloride salts has a direct effect on the corrosion of structures and vehicles and decreases durability as well as road pavement damage. A novel slow-release deicer with a core-shell structure was prepared to reduce the sal
Externí odkaz:
https://doaj.org/article/1645f254d4604cc1b1891fdd04332496
Autor:
Zhengwei Huang, Zheng Liu, Jingping Liang, Zisheng Tang, Rui Ma, Qian Wang, Zhiyan He, Yuejian Hu, Yuntao Jiang
Publikováno v:
Sensors, Vol 12, Iss 5, Pp 6176-6185 (2012)
AI-2–mediated quorum sensing has been identified in various bacteria, including both Gram-negative and Gram-positive species, and numerous phenotypes have been reported to be regulated by this mechanism, using the luxS-mutant strain. But the AI-2 p
Externí odkaz:
https://doaj.org/article/0fdf5b687e2a4921aed44863fcdb0e56
Akademický článek
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Publikováno v:
Records of Natural Products. :585-591
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a1c18452e3c7003d848e6235995cec23
https://doi.org/10.25135/rnp.315.2112.2296
https://doi.org/10.25135/rnp.315.2112.2296
Publikováno v:
Biomedical Chromatography. 37
Shenmai injection (SMI), which tonifies Qi and prevents exhaustion, nourishes Yin and generates body fluid, is usually used in the treatment of shock with deficiency of Qi and Yin, coronary artery disease, viral myocarditis, granulocytopenia and chro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7660446f726106dc9e65ba1b1b898c65
https://doi.org/10.1002/bmc.5565
https://doi.org/10.1002/bmc.5565
Publikováno v:
IEEE Transactions on Circuits and Systems I: Regular Papers. 68:5182-5193
Load shift keying (LSK) has been widely used in a wireless power and data transfer (WPDT) system, owing to its low cost and power consumption. It was discovered that the demodulated data can flip when the coupling coefficient (k) between the transmit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61212bc3be24cbbde1e2c934875589ec
https://doi.org/10.1109/tcsi.2021.3111100
https://doi.org/10.1109/tcsi.2021.3111100
Autor:
Yuping, Li, Yujing, Zhang, Yongyang, Sun, Yunyi, Zhang, Jinghang, He, Jiangping, Hu, Yuntao, Jiang
Publikováno v:
Journal of Materials Science: Materials in Electronics; Jul2023, Vol. 34 Issue 21, p1-9, 9p
Autor:
Song Bai, Qingwei Liu, Xiaosong Yang, Yuntao Jiang, Gaoying Zhang, Yunhang Qiu, Giulia Argento, Alok Verma, Bert Verstraeten, Elton Bitinka, Chaoyu Chen, Martijn Jongen, Huanian You, Yvon Chai, Zhi-Yi Gao, Evan Little, Christopher Putnam, Dennis Loeffen, Perry Bao, Pavel Izikson
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59aff31a9487ae29d4f399f0370068ac
https://doi.org/10.1117/12.2615979
https://doi.org/10.1117/12.2615979
Publikováno v:
ECS Transactions. 60:173-178
Double patterning using 193 nm immersion lithography has been adapted as the solution to enable 20 nm technology nodes. In the Back end, Litho Etch Litho Etch (LELE) is considered as the most suitable process for this technology. The overlay control
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::042acd71c8031f30b401a22f30bd4d9c
https://doi.org/10.1149/06001.0173ecst
https://doi.org/10.1149/06001.0173ecst
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 17:1
With the continuous shrinking of critical dimension, it may require more time and effort to reduce or remove the lithography defects in the development process. Therefore, defect reduction has become one of the most important technical challenges in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::303eabb34af8b3dcc8a3fe75a240a05d
https://doi.org/10.1117/1.jmm.17.4.043508
https://doi.org/10.1117/1.jmm.17.4.043508