Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Yung-Yuan Chang"'
Autor:
Yung-Yuan Chang, 張永源
99
Cerium oxide is being used in panel glass polishing process. Panel glass polishing wastewater was composed of cerium oxide abrasive, glass powder, and some impurities. In this study, the used cerium oxide abrasive was recycled after filtratio
Cerium oxide is being used in panel glass polishing process. Panel glass polishing wastewater was composed of cerium oxide abrasive, glass powder, and some impurities. In this study, the used cerium oxide abrasive was recycled after filtratio
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/98966774019857537130
Publikováno v:
International Journal of Agriculture Innovation, Technology and Globalisation. 1:1
Publikováno v:
International Journal of Agriculture Innovation, Technology and Globalisation. 2:293
Autor:
Jui-Wen Pan, Pei Jung Tsai, Yeeu-Chang Lee, Cheng-Hui Wu, Yung-Yuan Chang, Shiang-Chih Yeh, Chia-Hung Hou, Chun-Hsien Ho, Yen-Yu Chou, Hsiu-Mei Chou, Min-Sheng Chu
Publikováno v:
Microelectronic Engineering. 105:86-90
This study employed roller imprint lithography and dry etching to fabricate patterned sapphire substrates (PSSs) of convex-shape with features of various heights. A soft polymer, polydimethylsiloxane (PDMS), was used as a mold to duplicate the patter
Publikováno v:
Applied optics. 52(7)
In this paper, we propose a method to analyze the light extraction efficiency (LEE) enhancement of a nanopatterned sapphire substrates (NPSS) light-emitting diode (LED) by comparing wave optics software with ray optics software. Finite-difference tim
Autor:
Jen-Lang Lue, Jen-Chung Chen, Cheng-Sung Huang, Shieh-Ming Chang, Yung-Yuan Chang, Ming-Yen Li, Wu Hsiao-Che
Publikováno v:
Journal of The Electrochemical Society. 154:H967
Aluminum oxide (Al 2 O 3 ) thin films have been prepared by the atomic layer deposition (ALD) using trimethylaluminum (TMA) and ozone (O 3 ) as precursors. The process pressure was varied from 200 mTorr to 1000 mTorr at 320°C, and its effect on the
Autor:
Jen-Lang Lue, Cheng-Sung Huang, Jen-Chung Chen, Wu Hsiao-Che, Shieh-Ming Chang, Yung-Yuan Chang, Ming-Yen Li
Publikováno v:
ECS Meeting Abstracts. :1072-1072
Aluminum oxide (Al 2 O 3 ) thin films have been prepared by the atomic layer deposition (ALD) using trimethylaluminum (TMA) and ozone (O 3 ) as precursors. The process pressure was varied from 200 mTorr to 1000 mTorr at 320°C, and its effect on the
Publikováno v:
Japanese Journal of Applied Physics. 38:1649
The crystallization behavior of nominal-composition GeSb2Te4films prepared by rf-magnetron sputtering are examined. The crystal structures of the as-sputtered and the annealed films at different annealing temperatures are identified by the X-ray diff
Publikováno v:
Applied Optics (1559-128X); 3/1/2013, Vol. 52 Issue 7, p1358-1367, 10p
Autor:
Ming-Yen Li, Yung-Yuan Chang, Hsiao-Che Wu, Cheng-Sung Huang, Jen-Chung Chen, Jen-Lang Lue, Shieh-Ming Chang
Publikováno v:
Journal of The Electrochemical Society; Nov2007, Vol. 154 Issue 11, pH967-H972, 6p, 3 Charts, 11 Graphs