Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Yung-Sung Chang"'
Autor:
Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung-Sung Chang, Sirapop Nuannimnoi, Albert S. Lin
Publikováno v:
IEEE Photonics Journal, Vol 11, Iss 5, Pp 1-15 (2019)
With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning. Machine learning has emerged in OPC/EPC problems because conventional opti
Externí odkaz:
https://doaj.org/article/869fded1798142f08ae4d278651d11d5
Studies on the Postharvest Storage and Storage diseases of Fresh Ginger ( Zingiber officinale Rosc.)
Autor:
Yung-Sung Chang, 張永松
91
The purpose of this study was to research the storage methods and diseases pathogens of fresh ginger(Zingiber officinal Rosc.)after harvest. The respiratory rate and ethylene production of two cultivars of fresh gingers were studied after
The purpose of this study was to research the storage methods and diseases pathogens of fresh ginger(Zingiber officinal Rosc.)after harvest. The respiratory rate and ethylene production of two cultivars of fresh gingers were studied after
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/71896465076594565254
Autor:
Yung-Sung Chang, 張永松
100
In the past decades, Taiwan Sugar Corporation (Taisuco) devoted to collect germplasms of Saccharum spontaneum around Taiwan, and introgressed elite traits into sugarcane cultivars, unfortunately, all the important germplasms were lost right
In the past decades, Taiwan Sugar Corporation (Taisuco) devoted to collect germplasms of Saccharum spontaneum around Taiwan, and introgressed elite traits into sugarcane cultivars, unfortunately, all the important germplasms were lost right
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/99601352457033863803
Autor:
Chandni Akbar, Sparsh Pratik, Rajat Butola, Sirapop Nuannimnoi, Parag Parashar, Yung Sung Chang, Shih H. Chen, Tejender Singh Rawat, Albert Lin
Publikováno v:
IEEE Photonics Journal, Vol 11, Iss 5, Pp 1-15 (2019)
With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning. Machine learning has emerged in OPC/EPC problems because conventional opti