Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Yung H. Liao"'
Publikováno v:
SPIE Proceedings.
Three types of photo developing and developing-like defect on DUV process were presented in this paper. Scumming of photoresist on nitride film during developing process which was resulted from interaction between by-product of nitride film depositio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::743d35b2e7f6f50a01b6e273753c276f
https://doi.org/10.1117/12.410099
https://doi.org/10.1117/12.410099
Publikováno v:
SPIE Proceedings.
Processing two consequent layers on the same exposure tool had long time been considered to be the terminated solution for overlay control by photolithography process engineers. Such measure would take advantage of excluding Lens distortion contribut
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83e5ca1b056abd0181220ca12832e4da
https://doi.org/10.1117/12.410069
https://doi.org/10.1117/12.410069