Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Yun-Kyeong Jang"'
Publikováno v:
Applied Physics Letters. 80:2592-2594
A degradation process of a resist was observed by an atomic force microscope (AFM) during AFM anodization lithography on a mixed Langmuir–Blodgett resist of palmitic acid and hexadecylamine. Based on the observation, we proposed a two-step mechanis
Autor:
Seok-Hwan Oh, Cheng Bai Xu, Yun-Kyeong Jang, Thomas Penniman, Seong-Woon Choi, Sung-Seo Cho, Jin-Young Yoon, Duk-Soo Kim, Seok Ho Kang, Shi-yong Lee, Woo-Sung Han, George G. Barclay, Kwang-Sub Yoon, Dong Won Chung
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
In this paper we investigate fundamental resist properties to enhance resolution and focus margin for immersion contact hole patterning. Basic chemistry factors have been used to manipulate the iso-focal region (the region of smallest critical dimens
Autor:
Seok-Hwan Oh, Hyoung-hee Kim, Kwang-Sub Yoon, Jin-Young Yoon, Yun-Kyeong Jang, So-Ra Han, Shi-yong Lee, Woo-Sung Han, Seong-Woon Choi
Publikováno v:
SPIE Proceedings.
Reflectivity comparison study of bottom anti reflectivity coating (BARC) was investigated at 30nm node devices with same gate width at different pitch sizes. The goal of this study is to elucidate the practical target of reflectivity for high NA imme
Autor:
Sung-Woon Choi, Suk-Joo Lee, Sook Lee, Sang-Wook Kim, Yun-Kyeong Jang, Sungsoo Suh, Woo-Sung Han, Yong-Jin Chun
Publikováno v:
SPIE Proceedings.
Virtual OPC concept is suggested for soothing the problem that the roadmap of semiconductor devices proceeds the rate of development of exposure tools. Virtual OPC uses the simulated CD data for an OPC modeling instead of the measured CD data. For su
Autor:
Man-Hyoung Ryoo, Yun Sook Chae, Sang-Jun Choi, Jung Hwan Hah, Yun-Kyeong Jang, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Publikováno v:
SPIE Proceedings.
ArF lithography is in the early stage of mass production and also is going to be further extended to 40nm generation with the aid of immersion lithography. Therefore, it is important to make ArF process production-friendly and extendible for the cont
Publikováno v:
Ultramicroscopy. 91(1-4)
An evenly mixed Langmuir film of hexadecylamine (HDA) and palmitic acid (PA) was prepared on the air-water interface and transferred to a Si substrate for the fabrication of nano-sized patterns. Vibrational spectrum of the transferred film shows that
Autor:
Hyun-Woo Kim, Yun-Kyeong Jang, Joo-Tae Moon, Subramanya Mayya, Sang-Gyun Woo, Man-Hyoung Ryoo, Jung Hwan Hah, Han-Ku Cho, Mitsuhiro Hata
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24:2209
Photolithography is a part of the top-down approach that forms the basis of various processes in the semiconductor industry, which has followed Moore’s law for new generations of devices. However, as feature sizes are scaled to the nanometer regime
Autor:
Jung Hwan Hah, Mayya, Subramanya, Hata, Mitsuhiro, Yun-Kyeong Jang, Hyun-Woo Kim, Manhyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Sep/Oct2006, Vol. 24 Issue 5, p2209-2213, 5p, 5 Black and White Photographs, 1 Diagram, 1 Graph