Výsledky vyhledávání - "Yumiko Takamori"

Electrocatalytic Oxidation of Amines on a Mediator-Modified Electrode by Electrochemical Copolymerization of Nitroxyl Radical Precursor Containing Pyrrole Side Chain and Bithiophene

Autor: Kentaro Yoshida, Yoshitomo Kashiwagi, Tetsuya Ono, Yumiko Takamori

Publikováno v: Electroanalysis. 25:2575-2577

This paper describes the electrocatalytic oxidation of amines on TEMPO (2,2,6,6-tetramethylpiperidine-1-oxyl)-modified electrodes prepared by electrochemical copolymerization of TEMPO precursor containing pyrrole side chain and 2,2′-bithiophene. Th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f0463e4481cf1ab9893924118e443ed1
https://doi.org/10.1002/elan.201300357

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Performance of a 0.5 NA broadband DUV step-and-scan system

Autor: Bob Patterson, Mark William Barrick, Karey L. Holland, Timothy J. Wiltshire, Katherine C. Norris, Joseph C. Vigil, Doug Bommarito, Yumiko Takamori

Publikováno v: SPIE Proceedings.

The Micrascan II is a 0.50 NA DUV, broadband illumination (245 nm to 252 nm) step-and- scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The tool has been designed to provide 350 nm res

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::853a2508ea61ccc95b777684688f85c9
https://doi.org/10.1117/12.150455

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Positive DUV resist (APEX-E) by IBM for SVGL Micrascan

Autor: Eric M. Apelgren, John S. Hargreaves, Karey L. Holland, Vasanti A. Deshpande, Yumiko Takamori, Nathan S. Thane, Peter Freeman

Publikováno v: SPIE Proceedings.

The imaging performance of IBM's positive DUV resist is evaluated on SVGL Micrascan. Preliminary results on GCA excimer laser are included. Contamination effects are studied using 0.5 micron lines and spaces on Micrascan I using cross-sections at var

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::246a0fa5e19dd5fb5c8c555370434679
https://doi.org/10.1117/12.148938

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Use of computer optimization programs for the enhancement of Nikon stepper throughput with defectivity reduction benefits

Autor: Yumiko Takamori, Christof G. Krautschik

Publikováno v: SPIE Proceedings.

It is known that the wafer shot maps generated by the Nikon stepper software are not truly optimum, and if one can understand the uniqueness of the Nikon software, more die may be placed on the wafer. We have developed two software applications: WAFE

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7088151975a0d27f16b04f93f59977f1
https://doi.org/10.1117/12.59818

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