Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Yuliy A. Kontsevoy"'
Publikováno v:
Modern Electronic Materials, Vol 7, Iss 2, Pp 63-71 (2021)
The effect of parameters of plasma enhanced chemical vapor deposition (PECVD) processes for SiNx film fabrication on the electrical parameters of dielectric/АlGaN/GaN structures has been studied. The effect of growing film composition, additional he
Externí odkaz:
https://doaj.org/article/69a7427afc664f4f8b01da72c984ae42
