Zobrazeno 1 - 10
of 64
pro vyhledávání: '"Yuli Vladimirsky"'
Publikováno v:
Journal of Physics D: Applied Physics. 36:2471-2482
By using the near field in proximity x-ray lithography (PXL), a technique is demonstrated that extends beyond a resolution of 25 nm print feature size for dense lines. ‘Demagnification by bias’ of clear mask features is positively used in Fresnel
Publikováno v:
Journal of Physics D: Applied Physics. 33:2133-2141
The adoption of a novel method for producing fine features by 1 nm proximity x-ray lithography would solve all of the current technical limitations to its extensibility. These limitations include the fabrication of fine features on masks and the main
Autor:
Francesco Cerrina, W. Rodrigues, Yuli Vladimirsky, Harun H. Solak, Wenbing Yun, Daniel Legnini, Peter Ilinski, Barry Lai, Zhonghou Cai
Publikováno v:
Journal of Applied Physics. 86:884-890
We report measurement of strain in patterned Al–Cu interconnect lines with x-ray microdiffraction technique with a ∼1 μm spatial resolution. Monochromatized x rays from an undulator were focused on the sample using a phase fresnel zone plate and
Publikováno v:
Microelectronic Engineering. 46:457-460
In order to improve overlay capabilities for future exposure tools, it is necessary to understand the contributions from various sources. The most important contributions come from well-known sources like mask pattern placement accuracy, alignment sy
Autor:
E. Di Fabrizio, Azalia A. Krasnoperova, Yuli Vladimirsky, Zhonghou Cai, W. Yun, Franco Cerrina, Jörg Maser, Barry P. Lai, Daniel Legnini, Massimo Gentili, Efim Gluskin, Zheng Chen
Publikováno v:
Review of Scientific Instruments. 70:2238-2241
Focusing of 8 keV x rays to a spot size of 150 and 90 nm full width at half maximum have been demonstrated at the first- and third-order foci, respectively, of a phase zone plate (PZP). The PZP has a numerical aperture of 1.5 mrad and focusing effici
Publikováno v:
Macromolecules. 30:2386-2390
The one- and two-dimensional nuclear magnetic resonance spectra of X-ray-irradiated poly(methyl methacrylate) (400-MHz 1H and 100-MHz 13C) have been obtained. The one-dimensional hydrogen spectrum and the two-dimensional H, H-COSY, HMQC, and HMBC spe
Publikováno v:
Microelectronic Engineering. 35:545-548
Preliminary results of a novel techinique for producing true three-dimensional patterns in thick resits are presented in this work.
PMMA as an X-ray resist for micro-machining application: Latent image formation and thickness losses
Autor:
Olga Vladimirsky, J. M. Klopf, Gina M. Calderon, Volker Saile, Yuli Vladimirsky, Kevin J. Morris
Publikováno v:
Microelectronic Engineering. 30:543-546
This paper reports preliminary results of direct observation of a latent image formed in thick PMMA resist after X-ray exposure.
Autor:
Harish M. Manohara, Gina M. Calderon, Yuli Vladimirsky, Kevin J. Morris, J. M. Klopf, Olga Vladimirsky
Publikováno v:
IEEJ Transactions on Electronics, Information and Systems. 116:1323-1333
Autor:
Lev Ryzhikov, Yuli Vladimirsky
Publikováno v:
SPIE Proceedings.
This paper presents an approach to Laser Illumination System (LIS) efficiency optimization for High Numerical Aperture (NA) Microlithography exposure tools. These advanced tool are immersion systems with NA>1 utilizing many Reticle Enhancement Techni