Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Yuko Tsutsui Ito"'
Stratified polymer dissolution model based on impedance data from quartz crystal microbalance method
Autor:
Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Takashi Hasebe, Kazuo Sakamoto, Makoto Muramatsu
Publikováno v:
Applied Physics Express, Vol 17, Iss 8, p 086502 (2024)
In lithography, the development process is essential for achieving high fidelity. The quartz crystal microbalance (QCM) method is a primary tool for analyzing the dissolution kinetics of resist polymers by measuring their frequency and impedance. How
Externí odkaz:
https://doaj.org/article/e3cf8e06d0684f73ae5926a5b62d78ea
Autor:
Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro KOZAWA, Kazuo Sakamoto, Makoto Muramatsu
Publikováno v:
Japanese Journal of Applied Physics.
The development of high-numerical aperture exposure tools for extreme ultraviolet lithography is in progress. The development process (the dissolution of resist films) is the key to fine patterning. The dissolution dynamics of acidic polymers (the ba
Publikováno v:
Journal of inorganic biochemistry. 238
Nitric oxide synthase (NOS) is a cytochrome P450-type mono‑oxygenase that catalyzes the oxidation of L-arginine to nitric oxide. We previously observed that intramolecular electron transfer from biopterin to Fe
Publikováno v:
Japanese Journal of Applied Physics. 62:036503
A 0.26 M tetramethylammonium hydroxide (TMAH) aqueous solution has been used as a standard developer for manufacturing semiconductor devices. Alternative developers have recently attracted much attention because the 0.26 M TMAH developer may be appro
Publikováno v:
Japanese Journal of Applied Physics. 62:036502
For the advancement of lithography, the resist materials and processes are the most critical factors. In particular, the process of developing resist materials is important in reducing the line width roughness and stochastic defects. In this study, a
Publikováno v:
Journal of Inorganic Biochemistry. 238:112035
Publikováno v:
Japanese Journal of Applied Physics. 61:066506
The dissolution (including the formation of a transient swelling layer) of a resist polymer is key to realizing ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the swelling and disso
Autor:
Takahiro Kozawa, Yuko Tsutsui Ito
Publikováno v:
Japanese Journal of Applied Physics. 61:016502
With the sharpening of optical images, the capability of resist materials has become a serious concern in lithography. The dissolution of a resist polymer is key to the realization of ultrafine patterning. However, the details of the dissolution of r