Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Yukio Kakizaki"'
Autor:
Saori Fukui, Aoyama Takashi, Kazuaki Suzuki, Toshimasa Shimoda, Takaharu Miura, Tomoharu Fujiwara, Hiroshi Hirose, Junji Ikeda, Futoshi Mori, Hiroyasu Shimizu, Hidekazu Takekoshi, Shigeru Takemoto, Norihiro Katakura, Takehisa Yahiro, Toru Tanida, Kenji Morita, Yoshiaki Kohama, Suzuki Motoko, Atsushi Yamada, Takaaki Umemoto, Yukiharu Ohkubo, Teruaki Okino, Kaoru Ohmori, Takeshi Yoshioka, Yoichi Watanabe, Yukio Kakizaki, Shintaro Kawata, Shohei Suzuki, Noriyuki Hirayanagi, Shinichi Kojima, Hajime Yamamoto, Jin Udagawa, Kazunari Hada
Publikováno v:
J. Vac. Sci. Technol. B. 22(No. 6):2885-2890
Electron projection lithography (EPL) is a realistic technology for the 65nm node and below, as a complementary technology of optical lithography especially for contacts and gate layers because of its high resolution and large process margin. Nikon h
Autor:
Atsushi Yamada, Kaoru Ohmori, Yukiharu Ohkubo, Kazuaki Suzuki, Junji Ikeda, Yoichi Watanabe, Toshimasa Shimoda, Noriyuki Hirayanagi, Takaaki Umemoto, Yukio Kakizaki, Kenji Morita, Takehisa Yahiro, Masaya Miyazaki, Takaharu Miura, Futoshi Mori, Toru Tanida, Shigeru Takemoto, Takeshi Yoshioka, Hidekazu Takekoshi, Kazunari Hada, Jin Udagawa, Shintaro Kawata
Publikováno v:
SPIE Proceedings.
Electron Projection Lithography (EPL) is considered one of promising technologies below 45nm node, especially for contact/via holes and gate layers. EPL has some nice features such as very high resolution to be applied for two device nodes, large pro
Autor:
Shigeru Takemoto, Yukiharu Ohkubo, Suzuki Motoko, Shinichi Kojima, Kazuya Okamoto, Takeshi Yoshioka, Kaminaga Takeshi, Toru Tanida, Atsushi Yamada, Sumito Shimizu, Hiroyasu Shimizu, Masateru Tokunaga, Keiichi Hirose, Muneki Hamashima, Takaharu Miura, Tatsuo Sato, Kazunari Hada, Teruaki Okino, Yu Sato, Takehisa Yahiro, Jin Udagawa, Tomoharu Fujiwara, Shin-ichi Takahashi, Yoshiaki Kohama, Junji Ikeda, Hajime Yamamoto, Noriyuki Hirayanagi, Shintaro Kawata, Satoshi Katagiri, Hiroshi Hirose, Futoshi Mori, Takaaki Umemoto, Kazuaki Suzuki, Toshimasa Shimoda, Saori Fukui, Yoichi Watanabe, Yukio Kakizaki, Kenji Morita, Hidekazu Takekoshi
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21:2686
Electron projection lithography (EPL) is one of the promising technologies below the 65 nm node, especially for contact hole and gate layers. Nikon is developing an EPL exposure tool as an electron beam (EB) stepper and the first generation EB steppe
Autor:
Kazunari Hada, Masateru Tokunaga, Masaya Miyazaki, Yu Sato, Yukio Kakizaki, Takaharu Miura, Tatsuo Sato
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 1:313
In the development of the electron beam projection lithography (EPL) tool, one of the most important tasks is to develop the high-speed vacuum stage system and reliable vacuum body system. Nikon has a long history of over 22 years in precision stage
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