Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Yuki Ubayashi"'
Autor:
Yuki Ubayashi, Alexandra Krawicz, Kazuyoshi Ohta, Alberto D. Dioses, Yayi Wei, Joseph E. Oberlander, Shinji Miyazaki, Francis M. Houlihan, Ping-Hung Lu, Lin Zhang, Sumathy Vasanthan, Meng Li, Mark Neisser
Publikováno v:
Journal of Photopolymer Science and Technology. 21:383-392
We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's.
Autor:
Shinji Miyazaki, Deepa Parthasarathy, Yuki Ubayashi, Edward Ng, Charito Antonio, Yasushi Akiyama, Takanori Kudo, Richard Collett, Alberto D. Dioses, Kazuma Yamamoto, Munirathna Padmanaban, Mark Neisser, Srinivasan Chakrapani
Publikováno v:
SPIE Proceedings.
Developable bottom anti-reflective coatings (DBARC) are an emerging litho material technology. The biggest advantage of DBARC is that it eliminates the plasma etch step, avoiding damage to plasma sensitive layers during implantation. AZ has pioneered