Zobrazeno 1 - 10
of 61
pro vyhledávání: '"Yuji Shinano"'
Publikováno v:
Frontiers in Energy Research, Vol 11 (2023)
It is important to design multi-energy supply systems optimally in consideration of their operations for variations in energy demands. An approach for efficiently solving such an optimal design problem with a large number of periods for variations in
Externí odkaz:
https://doaj.org/article/f78d072796ac41caaa3647eaae3ddde3
Publikováno v:
EURO Journal on Transportation and Logistics, Vol 11, Iss , Pp 100091- (2022)
The routing of commodities is a tactical problem in supply chain management that aims to synchronise transportation services connecting a network of warehouses and consolidation locations. This paper considers the routing of commodities in a transpor
Externí odkaz:
https://doaj.org/article/34e0c1f3bcee43dca3c0fca35d64b0ed
Publikováno v:
Journal of Advanced Mechanical Design, Systems, and Manufacturing, Vol 7, Iss 4, Pp 608-618 (2013)
The purpose of this work is to improve the throughput of step-and-scan lithography equipment to shorten the production time of a wafer. For this purpose, we propose a method for solving the MSOP (Movement Sequence Optimization Problem), which is the
Externí odkaz:
https://doaj.org/article/576563bfdafc48c09bc3486d31467876
Publikováno v:
Journal of Advanced Mechanical Design, Systems, and Manufacturing, Vol 4, Iss 4, Pp 785-793 (2010)
The present paper considers optimization of lens adjustment in semiconductor lithography equipment. For improving productivity, the laser irradiation power of recent semiconductor lithography equipment has been boosted, which causes significant aberr
Externí odkaz:
https://doaj.org/article/cce01d0d9c284619b242f4a99537699b
Publikováno v:
Journal of Advanced Mechanical Design, Systems, and Manufacturing, Vol 2, Iss 5, Pp 844-852 (2008)
In this paper, we address the problem of lens aberration adjustment for lenses of semiconductor lithography equipment. The objective of aberration adjustment is to minimize the maximum value of aberration in any part of the images that are projected
Externí odkaz:
https://doaj.org/article/fcd062ccb92c47edb73c75d0421c7321
Publikováno v:
Journal of Advanced Mechanical Design, Systems, and Manufacturing, Vol 2, Iss 3, Pp 378-384 (2008)
In this paper, we consider the problem of lens distortion adjustment of semiconductor lithography equipment. The objective of adjustment is to minimize the maximum absolute value of distortion. Formerly, an approximate solution method based on the le
Externí odkaz:
https://doaj.org/article/92d03bf3f1f54481a2600526e78c4668
Autor:
Nariaki Tateiwa, Yuji Shinano, Masaya Yasuda, Shizuo Kaji, Keiichiro Yamamura, Katsuki Fujisawa
Publikováno v:
Japan Journal of Industrial and Applied Mathematics.
Autor:
Ksenia Bestuzheva, Mathieu Besançon, Wei-Kun Chen, Antonia Chmiela, Tim Donkiewicz, Jasper van Doornmalen, Leon Eifler, Oliver Gaul, Gerald Gamrath, Ambros Gleixner, Leona Gottwald, Christoph Graczyk, Katrin Halbig, Alexander Hoen, Christopher Hojny, Rolf van der Hulst, Thorsten Koch, Marco Lübbecke, Stephen J. Maher, Frederic Matter, Erik Mühmer, Benjamin Müller, Marc E. Pfetsch, Daniel Rehfeldt, Steffan Schlein, Franziska SchlÃŰsser, Felipe Serrano, Yuji Shinano, Boro Sofranac, Mark Turner, Stefan Vigerske, Fabian Wegscheider, Philipp Wellner, Dieter Weninger, Jakob Witzig
Publikováno v:
ACM Transactions on Mathematical Software.
The SCIP Optimization Suite provides a collection of software packages for mathematical optimization centered around the constraint integer programming framework SCIP . The focus of this paper is on the role of the SCIP Optimization Suite in supporti
Publikováno v:
2022 IEEE International Parallel and Distributed Processing Symposium Workshops (IPDPSW).