Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Yuichi Matsuzawa"'
Autor:
Saki Saito, Mitsutoshi Yamada, Rika Yano, Kazuko Takahashi, Akiko Ebara, Hiroe Sakanaka, Miho Matsumoto, Tomoko Ishimaru, Hiroki Utsuno, Yuichi Matsuzawa, Reina Ooka, Mio Fukuoka, Kazuhiro Akashi, Shintaro Kamijo, Toshio Hamatani, Mamoru Tanaka
Publikováno v:
Journal of Ovarian Research, Vol 16, Iss 1, Pp 1-11 (2023)
Abstract Background The indications for fertility preservation (FP) have expanded. A few patients who underwent gonadotoxic treatment did not have the opportunity to receive FP, leading to concerns that these patients may develop premature ovarian in
Externí odkaz:
https://doaj.org/article/c244923caf494185a9343c491ca4cb7d
Autor:
Kenji IZUMI, Takashi TAKEDA, Kei SHIRAISHI, Yuichi MATSUZAWA, Arata KOBAYASHI, Satoru SHIRAISHI
Publikováno v:
Tokai Journal of Experimental & Clinical Medicine; Dec2023, Vol. 48 Issue 4, p128-132, 5p
Autor:
Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, Hozumi Usui
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::138b1047019c6f9b166c42639c8b941e
https://doi.org/10.1117/12.458332
https://doi.org/10.1117/12.458332
Autor:
Yuko Oi, Yuichi Matsuzawa, Masayoshi Tsuzuki, Jun Yoshida, Shinji Akima, Wataru Nozaki, Yoshiro Yamada
Publikováno v:
SPIE Proceedings.
Be accompanied with gate length will tend to be smaller in LSI manufacturing, assist bar type OPC masks are vigorously investigated to take into mass production. In this research, we examined problems about manufacturing and guarantee of assist bar t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b977ad230ecb6ae49dbd12f00f5152fd
https://doi.org/10.1117/12.438399
https://doi.org/10.1117/12.438399
Autor:
Jun Yoshida, Naoki Takahashi, Yuko Oi, Masayoshi Tsuzuki, Jun Kotani, Yuji Kodaira, Yuichi Matsuzawa, Yoshiro Yamada
Publikováno v:
SPIE Proceedings.
Improvement of Critical Dimension (CD) accuracy is one ofthe most important issues for high-end reticle fabrication. Two major obstacles remain even after careftil CD optimization efforts. One is foggy effect, which is related to writing system, and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0d562451cfe9c16c9cd31b9cb22e71c
https://doi.org/10.1117/12.410702
https://doi.org/10.1117/12.410702
Autor:
Noriaki Takagi, Naoki Takahashi, Yoshiro Yamada, Masayoshi Tsuzuki, Yuichi Matsuzawa, Jun Yoshida
Publikováno v:
SPIE Proceedings.
Along with the rapid generation change of lithography and widened application of OPC, the process for High Accelerated Voltage E-Beam reticle is changing from Wet Etching to Dry Etching. Establishment and optimization of Dry Etching process becomes u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0d63ace297efb28f1177d716dc0cb36
https://doi.org/10.1117/12.373340
https://doi.org/10.1117/12.373340
Autor:
Hiroyuki Takahashi, Susumu Nagashige, Kazuaki Chiba, Kohki Hayashi, Yoshiro Yamada, Yuichi Matsuzawa, Shinji Akima
Publikováno v:
SPIE Proceedings.
Alternating Phase-Shift Mask (Alt-PSM) is one of the key technologies for 0.15 micrometer or below rule device fabrication. But it is not yet widely utilized because of difficulty on phase controllability and defect controllability. Through more than
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90a2067e84d60f4a73a91b2eb446b0fd
https://doi.org/10.1117/12.373308
https://doi.org/10.1117/12.373308
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Conference
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