Zobrazeno 1 - 10
of 103
pro vyhledávání: '"Yuan-Hong Song"'
Publikováno v:
AIP Advances, Vol 9, Iss 5, Pp 055019-055019-10 (2019)
A one-dimensional fluid/Monte Carlo hybrid model was used to quantitatively study the secondary electron effect on sustaining the discharge by examining the ionization induced by bulk electrons and secondary electrons under different external dischar
Externí odkaz:
https://doaj.org/article/9bd19cb3ab144b8f91f6d367a3a8dba0
Publikováno v:
Plasma Sources Science and Technology. 32:045002
With the increasing demands toward large area plasma etching and deposition, the radial uniformity of capacitively coupled plasmas (CCPs) becomes one of the key factors that determine process performance in industrial applications. However, there is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce578b476435a6ae8914f3b9287337a0
https://doi.org/10.1088/1361-6595/acc6e9
https://doi.org/10.1088/1361-6595/acc6e9
Publikováno v:
Plasmonics
We analyze the effects of the strain-induced pseudomagnetic field on the subthreshold mechanism of hybridization taking place between the Dirac plasmon in graphene and the surface optical phonon modes in a nearby substrate. It is shown that the pseud
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::90de4ad30a0a4c65dd529ee0742435b9
https://doi.org/10.1007/s11468-020-01369-3
https://doi.org/10.1007/s11468-020-01369-3
Publikováno v:
Plasma Sources Science and Technology. 31:105013
The plasma conductivity is an important input parameter for various plasma models. It is typically obtained from a simplified version of the electron momentum balance equation, where only a single inertia term and a simplified description of the coll
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf98a7ca903a4d1f53a29388475903b1
https://doi.org/10.1088/1361-6595/ac95c1
https://doi.org/10.1088/1361-6595/ac95c1
Publikováno v:
Chinese Physics B. 31:085202
Two classic radio-frequency (RF) plasmas, i.e., the capacitively and the inductively coupled plasmas (CCP and ICP), are widely employed in material processing, e.g., etching and thin film deposition, etc. Since RF plasmas are usually operated in part
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa4623dcaace5aecee938db9a248c58a
https://doi.org/10.1088/1674-1056/ac7551
https://doi.org/10.1088/1674-1056/ac7551
Autor:
Li Wang, Máté Vass, Zoltán Donkó, Peter Hartmann, Aranka Derzsi, Yuan-Hong Song, Julian Schulze
Publikováno v:
Plasma Sources Science and Technology. 31:06LT01
The magnetized drift-ambipolar (‘m-DA’) electron power absorption mode and a sequence of structural transitions, including the formation of an electropositive core where the electron density is much higher than the negative ion density, are ident
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f342819149b317ad19a366f7dc7a38b1
https://doi.org/10.1088/1361-6595/ac5ec7
https://doi.org/10.1088/1361-6595/ac5ec7
Publikováno v:
2020 IEEE International Conference on Plasma Science (ICOPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76d6e1a36490f5f14c31493e7811f592
https://doi.org/10.1109/icops37625.2020.9717820
https://doi.org/10.1109/icops37625.2020.9717820
Publikováno v:
European Physical Journal D. Atoms, Molecules, Clusters and Optical Physics
A two-component hydrodynamic model is used to investigate low-energy plasmon excitations within the K and K′ valleys of the π electron bands in doped graphene on a dielectric substrate by a slow charged particle moving parallel to the graphene in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d37284f4ec49ef56c1270762c394636e
https://doi.org/10.1140/epjd/e2019-100450-1
https://doi.org/10.1140/epjd/e2019-100450-1
Publikováno v:
Journal of Physics D: Applied Physics. 55:200001
In this work, the electron power absorption mode transition in capacitively coupled Ar/CF4 discharges is investigated by using a one-dimensional fluid/electron Monte Carlo hybrid model. Different electron power absorption modes are observed under var
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb739491ee425430f1921812ebcd8216
https://doi.org/10.1088/1361-6463/ac52cd
https://doi.org/10.1088/1361-6463/ac52cd
Publikováno v:
Plasma Sources Science and Technology. 31:025006
Radio frequency capacitively coupled plasmas (RF CCPs) sustained in fluorocarbon gases or their mixtures with argon are widely used in plasma-enhanced etching. In this work, we conduct studies on instabilities in a capacitive CF4/Ar (1:9) plasma driv
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46a070a7b58fafbb47a5009f84e53ac5
https://doi.org/10.1088/1361-6595/ac47e4
https://doi.org/10.1088/1361-6595/ac47e4