Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Yu.Ya. Platonov"'
Publikováno v:
Plasma Sources Science and Technology. 5:578-581
X-ray images of the compression phase of a deuterium-embedded argon pinch plasma generated with the SPEED 2 driver in a plasma focus configuration were obtained. To record spectral selective images, an x-ray microscope based on cylindrically bent mul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c0391e8cda744570b3947054491dcc0
https://doi.org/10.1088/0963-0252/5/3/028
https://doi.org/10.1088/0963-0252/5/3/028
Autor:
Frederik Bijkerk, A. A. Sorokin, L. A. Shmaenok, N. N. Salashchenko, A.Ya. Grudsky, D. M. Simanovskii, Yu.Ya. Platonov, A. V. Golubev, V.P. Belik, B. Etlicher, Eric Louis, S. V. Bobashev, F.G. Meijer
Publikováno v:
Journal of Electron Spectroscopy and Related Phenomena. 80:259-262
Recent developments of multilayer polychromators for the EUV and the soft x-ray range are reported. Upgrading and optimization of multilayers and filters, and a modular design boosted applications at various plasma facilities. Results of experiments
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fc7d1a2add8c3f7ba1a52deb752e3ba
https://doi.org/10.1016/0368-2048(96)02970-2
https://doi.org/10.1016/0368-2048(96)02970-2
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 359:114-120
Layered synthetic nanostructures are considered both as normal incidence imaging and dispersive optical elements in the soft X-ray range and as filters of γ-radiation for Mossbauer spectroscopy.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2dd1557d89040f41ebed67e656f6e6c
https://doi.org/10.1016/0168-9002(94)01388-8
https://doi.org/10.1016/0168-9002(94)01388-8
Autor:
Eric Louis, Frederik Bijkerk, F. Voβ, Yu.Ya. Platonov, Alexander V. Mitrofanov, A. van Honk, B. Nicolaus, L. A. Shmaenok, H. Frowein, R. Desor, Alexander P. Shevelko, M.J. van der Wiel
Publikováno v:
Microelectronic Engineering. 23:211-214
Results of optimization of an excimer laser-induced plasma x-ray source for projection lithography in the range λ = 13–15 nm are reported. A conversion efficiency of >0.7% in 2% BW has been achieved with high-Z target materials. Two methods of red
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e16ae49e14d3beec1cb4acafb8b51fc
https://doi.org/10.1016/0167-9317(94)90139-2
https://doi.org/10.1016/0167-9317(94)90139-2
Autor:
G.E. van Dorssen, Yu.Ya. Platonov, Rutger Schlatmann, H.-J. Voorma, Howard A. Padmore, N.B. Koster, L. A. Shmaenok, Eric Louis, Frederik Bijkerk, J. Verhoeven
Publikováno v:
Microelectronic Engineering, 23, 215-218
In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both met
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2fcb48965444fa0fc144d9605ceb41c0
https://doi.org/10.1016/0167-9317(94)90140-6
https://doi.org/10.1016/0167-9317(94)90140-6
Publikováno v:
Journal of X-ray science and technology. 6(3)
This work is devoted to the experimental investigation of incoherent soft x-ray radiation from an electron cyclotron resonance discharge with pumping by a millimeter-wave beam from a gyrotron. The basic contribution to the x-ray spectrum was shown to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f5ad0e4275b0a6477adb9ee5506a9a24
https://pubmed.ncbi.nlm.nih.gov/21307525
https://pubmed.ncbi.nlm.nih.gov/21307525
Autor:
N. N. Salashchenko, N.E. Malysheva, A.N. Sosphenov, Yu.Ya. Platonov, N. N. Novikova, A. D. Akhsakhalyan, S. I. Zheludeva, M. V. Kovalchuk
Publikováno v:
Thin Solid Films. 232:252-255
Information about the structure of organic monolayers of fatty acid salts and phospholipids deposited by the Langmuir-Blodgett technique on layered substrates has been obtained for the first time with the help of amplitude-modulated X-ray standing wa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61d6055e1b3510b61f57bf6eab5aa07c
https://doi.org/10.1016/0040-6090(93)90017-j
https://doi.org/10.1016/0040-6090(93)90017-j
Autor:
E. N. Ragozin, Yu.Ya. Platonov, M M Mitropol'skii, Nikolai N. Salashchenko, A A Vasil'ev, Yu.Yu. Pokrovskii, Alexander P. Shevelko
Publikováno v:
Quantum Electronics. 25:387-389
Multilayer mirror optics was used in a pulse-periodic laser-plasma source of quasimonochromatic polarised x-rays. A calculation was made of the reflectivity and polarisability of multilayer mirrors at wavelengths λ = 17–18 nm. The experimental res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::027aae6b2ea9db9a991ad4a102be48de
https://doi.org/10.1070/qe1995v025n04abeh000369
https://doi.org/10.1070/qe1995v025n04abeh000369
Autor:
N.B. Koster, Yu.Ya. Platonov, H.-J. Voorma, C. Bruineman, Johannes A. Romijn, R. K. F. J. Bastiaensen, T. Zijlstra, L. E. M. de Groot, Eric Louis, N. N. Salashchenko, B. A. C. Rousseeuw, L. A. Shmaenok, Frederik Bijkerk, E. van der Drift
Publikováno v:
Microelectronic Engineering, 30, 183-186
Scopus-Elsevier
Scopus-Elsevier
Results are reported on the development of a laser plasma source and the fabrication of multilayer reflection masks for extreme ultra-violet lithography (EUVL). A new concept of a target for a laser plasma source is presented including experimental e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d0684458fb2dfc83f2aecda333c46f7
https://doi.org/10.1016/0167-9317(95)00222-7
https://doi.org/10.1016/0167-9317(95)00222-7
Autor:
E. A. Shamov, Frederik Bijkerk, Yu.Ya. Platonov, S. Yu. Zuev, N.B. Koster, N. N. Salashchenko, S. S. Andreev, H.-J. Voorma, Eric Louis
Publikováno v:
Microelectronic Engineering, 27, 235-238
In this paper we present normal incidence reflectivity measurements of EUV reflective multilayer coatings for lambda = 13-14 nm, the wavelength of interest for EUV projection lithography. The multilayer coatings are produced by e-beam evaporation in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9e213865f9b63e8fe9cf859b67a6977d
https://doi.org/10.1016/0167-9317(94)00096-d
https://doi.org/10.1016/0167-9317(94)00096-d