Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Yu. V. Syrov"'
Publikováno v:
Тонкие химические технологии, Vol 12, Iss 6, Pp 83-90 (2017)
Synthesis and study of complex chalcogenides in the low oxidation state opens unexpected new opportunities of studying some fundamental problems of condensed matter physics. Dichalcogenides of transition metals, i.e., compounds with the general formu
Externí odkaz:
https://doaj.org/article/607cd507773c4b3a9c2a749674df4987
Autor:
A. S. Kovaleva, Olga S. Tarasova, A. I. Dontsov, Yu. V. Syrov, I. Ya. Mittova, B. V. Sladkopevtsev
Publikováno v:
Inorganic Materials. 57:663-668
Surface modification of GaAs in sulfur vapor by different procedures and subsequent annealing and thermal oxidation have an advantageous effect on the properties of heterostructures, ensuring binding of the constituent components of the substrate and
Autor:
Svetlana S. Kormilitsina, Yu. V. Syrov, E. V. Zharikova, R. Yu. Kozlov, S. N. Knyzev, D. A. Zavrazhin, Elena V. Molodtsova
Publikováno v:
Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 24:48-56
The method of plane-transverse bending was used to measure the strength of thin single-crystal plates of undoped InSb with a crystallographic orientation of (100). It was found that the strength of the plates (thickness ≤ 800 μm) depends on their
Publikováno v:
Doklady Chemistry. 495:178-181
It has been shown that the difference in the structure of electronic orbitals of silicon and germanium atoms is a decisive factor responsible for the formation of porous layers during their electrochemical etching in solutions of hydrofluoric acid.
Autor:
V. I. Shvets, A. G. Yakovenko, E. N. Abramova, A. M. Khort, Yu. V. Syrov, E. A. Slipchenko, V. N. Tsigankov
Publikováno v:
Доклады Академии наук. 487:32-35
Peculiarities of porous silicon layers formation during electrochemical etching of p-type silicon were studied. Principal divisions of pore formation mechanisms in n-type and p-type of silicon were demonstrated.
Autor:
E. N. Abramova, T. A. Sorokin, A. M. Khort, Yu. V. Syrov, V. I. Shvets, M. V. Tsygankova, A. G. Yakovenko
Publikováno v:
Doklady Chemistry. 481:166-169
The change in the photoluminescence peaks of porous silicon at λ = 640–670 and 540–560 nm at 300 and 77 K, as well as their behavior after low-temperature annealing of the samples at 500°С, has been studied. The change in these peaks correlate
Publikováno v:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. 12:217-221
It is established that the crystallographic orientation of a single-crystal silicon substrate affects the nucleation, shape, and evolution of silicon pores during its electrochemical etching. The shape, spatial orientation, and initiation of silicon
Autor:
E. A. Slipchenko, E. N. Abramova, A. M. Khort, V. N. Tsygankov, Yu. V. Syrov, A. G. Yakovenko, V. I. Shvets
Publikováno v:
Doklady Chemistry. 487:165-167
Features of the formation of porous silicon layers during anodic etching of p-Si were considered. A fundamental difference between the mechanisms of the formation of nanostructured layers on p-and n-Si was shown.
Publikováno v:
Inorganic Materials. 52:979-984
Variations in the contours of pores produced in n-type silicon by electrochemical etching in hydrofluoric acid solutions are interpreted in terms of the mechanism underlying the chemical interaction of the etchant with silicon and the anisotropy of t
Autor:
Yu. V. Syrov
Publikováno v:
Doklady Chemistry. 471:365-367
The chemical reaction of single-crystal indium antimonide with saturated elemental sulfur vapor is diffusion-limited and leads to the formation of the triple layer In2S3–(xIn2S3 + (1–x)Sb2S3)–Sb on the surface of the samples. A model explaining