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pro vyhledávání: '"Yu. F. Trush"'
Publikováno v:
Crystallography Reports. 48:187-191
The influence of photoexcitation on the formation of the defect structure in GaAs crystals implanted with 200 keV Ar+ ions at doses of 1 × 1013, 3 × 1013, and 5 × 1013 cm−2 has been studied by high-resolution Xray diffractometry. It was found th