Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Yu-Pu Yang"'
Autor:
Wei-Lun Chen, Shang Shian Yang, Ning Hsiu Yuan, Wei Yu Zhou, Yu-Pu Yang, Hsiao-Han Lo, Peter J. Wang, Walter Lai, Yiin-kuen Fuh, Tomi T. Li
Publikováno v:
2022 China Semiconductor Technology International Conference (CSTIC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cddd7e4d1d43201ef88ab89b39a3b0bd
https://doi.org/10.1109/cstic55103.2022.9856787
https://doi.org/10.1109/cstic55103.2022.9856787
Publikováno v:
The International Journal of Advanced Manufacturing Technology. 114:1975-1990
In this study, aluminum nitride (AlN) thin films were deposited on Si (100) and investigated on the minimum film residual stress with varying two critical deposition conditions in N2 gas flow and power. The pulsed DC reactive sputtering of aluminum t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3f48f503e9f0107c602f41ef2a2e679
https://doi.org/10.1007/s00170-021-07003-8
https://doi.org/10.1007/s00170-021-07003-8
Autor:
Hsuan-Fan Chen, Yu-Pu Yang, Wei-Lun Chen, Peter J. Wang, Walter Lai, Yiin-Kuen Fuh, Tomi T. Li
Publikováno v:
Materials Chemistry and Physics. 295:127070
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7811dbb11e815909b18bf602dfc4c0f
https://doi.org/10.1016/j.matchemphys.2022.127070
https://doi.org/10.1016/j.matchemphys.2022.127070
Autor:
Yiin Kuen Fuh, Walter Lai, Te Yun Lu, Tomi T. Li, Peter J. Wang, Yu Pu Yang, Wei Lun Chen, Hsiao Han Lo
Publikováno v:
Materials; Volume 14; Issue 16; Pages: 4445
Materials, Vol 14, Iss 4445, p 4445 (2021)
Materials
Materials, Vol 14, Iss 4445, p 4445 (2021)
Materials
In this study, we submit a complex set of in-situ data collected by optical emission spectroscopy (OES) during the process of aluminum nitride (AlN) thin film. Changing the sputtering power and nitrogen(N2) flow rate, AlN film was deposited on Si sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2cae8737726e12fdf90f424f8aac66dc
Autor:
Song-Ho Wang, Yiin Kuen Fuh, Wei-Lun Chen, Walter Lai, Tomi T. Li, Yu Pu Yang, Peter J. Wang, Hsueh-Er Chang, Te-Yun Lu, Hsiao-Han Lo
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
Plasma enhanced chemical vapor deposition (PECVD) is commonly known to be used in the field of silicon thin-film solar systems for the application of nanocrystalline silicon (nc-Si:H) film. The chemical deposition is a rather lengthy process, and it
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::47d2c8adacd7cbd9b6ea990b35248638
https://doi.org/10.1109/cstic52283.2021.9461536
https://doi.org/10.1109/cstic52283.2021.9461536
Autor:
Song-Ho Wang, Tomi T. Li, Hsueh-Er Chang, Te-Yun Lu, Walter Lai, Peter J. Wang, Yiin Kuen Fuh, Yu Pu Yang
Publikováno v:
2020 China Semiconductor Technology International Conference (CSTIC).
In this study, pulsed dc reactive sputtering of aluminum nitride (AlN) thin films was investigated. The aluminum nitride thin films were deposited on Si (100) using a reactive direct current (DC) unbalanced magnetron sputtering system. The DC reactiv
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21ab8590d1d7c6aa6ca718849b6fc1d7
https://doi.org/10.1109/cstic49141.2020.9282480
https://doi.org/10.1109/cstic49141.2020.9282480
Publikováno v:
Journal of Shanghai University (English Edition). 9:534-538
As a new method for dealing with any nonlinear or non-Gaussian distributions, based on the Monte Carlo methods and Bayesian filtering, particle filters (PP) are favored by researchers and widely applied in many fields. Based on particle filtering, an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d849bb85554c9e4adfc821dad83063a1
https://doi.org/10.1007/s11741-005-0013-2
https://doi.org/10.1007/s11741-005-0013-2
Publikováno v:
2008 7th World Congress on Intelligent Control & Automation; 2008, p5520-5525, 6p
Publikováno v:
2008 7th World Congress on Intelligent Control & Automation; 2008, p6113-6117, 5p
Autor:
Xiao Bin He, Yu Pu Yang
Publikováno v:
Industrial & Engineering Chemistry Research; Jan2008, Vol. 47 Issue 2, p419-427, 9p