Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Yu-Po Tang"'
Autor:
Yu-Po Tang, 唐于博
92
The electrophoretic behavior of the so-called “soft particle” is investigated in this study for various systems using pseudo-spectral method. The analyses include the electrophoretic motion of soft particle in spherical cavity, the electr
The electrophoretic behavior of the so-called “soft particle” is investigated in this study for various systems using pseudo-spectral method. The analyses include the electrophoretic motion of soft particle in spherical cavity, the electr
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/67789992754749859907
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41402166820c2125d08c3d69567796d0
https://doi.org/10.1117/12.2663274
https://doi.org/10.1117/12.2663274
Publikováno v:
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ebde4ea4637a71e5181cb3f6ded4b15c
https://doi.org/10.1117/12.2640638
https://doi.org/10.1117/12.2640638
Autor:
Kevin Hooker, Guangming Xiao, Yu-Po Tang, Yunqiang Zhang, Moongyu Jeong, John Valadez, Kevin Lucas
Publikováno v:
Novel Patterning Technologies 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9b27e9cbe764d48df5acc661cb9785e
https://doi.org/10.1117/12.2618392
https://doi.org/10.1117/12.2618392
Publikováno v:
SPIE Proceedings.
A traditional approach to construct a fast lithographic model is to match wafer top-down SEM images, contours and/or gauge CDs with a TCC model plus some simple resist representation. This modeling method has been proven and is extensively used for O
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5816f82636324dbec7550e6f3d7308c
https://doi.org/10.1117/12.2045538
https://doi.org/10.1117/12.2045538
Publikováno v:
Journal of Colloid and Interface Science. 242:121-126
The electrophoresis of a charge-regulated spherical particle normal to a planar surface is analyzed theoretically. The present study extends previous analyses in that the surface of the particle assumes a general charged condition, which simulates bi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc96ceec15849384633e922261bbfa0a
https://doi.org/10.1006/jcis.2001.7770
https://doi.org/10.1006/jcis.2001.7770
Publikováno v:
SPIE Proceedings.
Traditionally, an optical proximity correction model is to evaluate the resist image at a specific depth within the photoresist and then extract the resist contours from the image. Calibration is generally implemented by comparing resist contours wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c9ed304f4c77bb99db13e9782823e65
https://doi.org/10.1117/12.2010846
https://doi.org/10.1117/12.2010846
Publikováno v:
SPIE Proceedings.
Calibration of mask images on wafer becomes more important as features shrink. Two major types of metrology have been commonly adopted. One is to measure the mask image with scanning electron microscope (SEM) to obtain the contours on mask and then s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df4240d56ccac8dd642b1ad227586096
https://doi.org/10.1117/12.917794
https://doi.org/10.1117/12.917794
Publikováno v:
SPIE Proceedings.
Typical OPC models focus on predicting wafer contour or CD; therefore, the modeling approach emphasizes careful determination of feature and edge locations in the photo-resist (PR) as well as the exposure threshold, so that the 'cut' model image matc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66949957a87d7ba3ac0382f0ba8d6e4d
https://doi.org/10.1117/12.917402
https://doi.org/10.1117/12.917402
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 20(21)
The boundary effect on the electrophoresis of particles covered by a membrane layer is discussed by considering a spherical particle in a spherical cavity under the conditions where the effect of double-layer polarization can be significant. The infl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e46be7838ca3c0c7512ab23541554a9d
https://pubmed.ncbi.nlm.nih.gov/15461538
https://pubmed.ncbi.nlm.nih.gov/15461538