Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Yu-Jen Fan"'
Autor:
Ying-Nan Tsai, Jia-Ling Wu, Cheng-Hao Tseng, Tzu-Haw Chen, Yi-Ling Wu, Chieh-Chang Chen, Yu-Jen Fang, Tzeng-Huey Yang, Mindie H. Nguyen, Jaw-Town Lin, Yao-Chun Hsu
Publikováno v:
Clinical and Molecular Hepatology, Vol 30, Iss 1, Pp 98-108 (2024)
Background/Aims Finite nucleos(t)ide analog (NA) therapy has been proposed as an alternative treatment strategy for chronic hepatitis B (CHB), but biomarkers for post-treatment monitoring are limited. We investigated whether measuring hepatitis B cor
Externí odkaz:
https://doaj.org/article/e6cca0a680c349dfb2095f17e98b207d
Publikováno v:
X-Ray Spectrometry. 43:102-107
X-ray photoelectron spectroscopy (XPS) is used for elemental identification and quantification in a number of fields, and the optimization of XPS performance can help in making better use of the limited XPS tool availability. In the field of extreme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0836dbd876fbbfc3f8c25c98cfeee34
https://doi.org/10.1002/xrs.2522
https://doi.org/10.1002/xrs.2522
Autor:
Warren Montgomery, Yu-Jen Fan, Jun Sung Chun, Cecilia A Montgomery, Scott McWilliams, Mac Mellish
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
EUV lithographers have continued to reduce the barriers to high Volume Manufacturing (HVM) introduction. Tool, mask and photoresist manufacturers have made excellent progress on several fronts, including resolution of many EUV source related issues,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::067f3cbdb76daece8a9e7bd34180f01f
https://doi.org/10.1117/12.2222065
https://doi.org/10.1117/12.2222065
Autor:
Chimaobi Mbanaso, Yunfei Wang, Yu-Jen Fan, Petros Thomas, Sungmin Huh, Alin Antohe, Ken Goldberg, Leonid Yankulin, Patrick P. Naulleau, Gregory Denbeaux, Iacopo Mochi, Andrea Wüest, Rashi Garg, Frank Goodwin
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:321-328
Carbon contamination is a significant issue with extreme ultraviolet (EUV) masks because it lowers throughput and has potential effects on imaging performance. Current carbon contamination research is primarily focused on the lifetime of the multilay
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5fe180492ee0836a6d996aa737333861
https://doi.org/10.1116/1.3333434
https://doi.org/10.1116/1.3333434
Autor:
Kevin Cummings, Vinayak Rastogi, Hiroie Matsumoto, Cecilia Montgomery, David Hetzer, Andrew Metz, Takashi Saito, Lior Huli, Warren Montgomery, Jun Sung Chun, Shih-Hui Jen, Yu-Jen Fan, Mark Neisser
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Recently there has been a great deal of effort focused on increasing EUV scanner source power; which is correlated to increased wafer throughput of production systems. Another way of increasing throughput would be to increase the photospeed of the ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6cf4314a90377bc339c98c2494066a11
https://doi.org/10.1117/12.2086982
https://doi.org/10.1117/12.2086982
Autor:
Cecilia Montgomery, Ken Matthews, Kevin Cummings, JunSung Chun, Paul D. Ashby, Yu-Jen Fan, Sean Valente, Mark Neisser
Publikováno v:
SPIE Proceedings.
EUV lithography is needed by the semiconductor industry for both its resolution and for the process simplification it provides compared to multiple patterning. However it needs innovations to make it a success. One area where innovation is needed is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2f2895c51198ee66d64f94d9aa2646c
https://doi.org/10.1117/12.2086307
https://doi.org/10.1117/12.2086307
Autor:
Cecilia Montgomery, Tonmoy Chakraborty, Jun Sung Chun, Mark Neisser, Shih-Hui Jen, Kevin Cummings, Ramakrishnan Ayothi, Dominic Ashworth, Ken Maruyama, Yu-Jen Fan, Takehiko Naruoka
Publikováno v:
SPIE Proceedings.
In this paper, we present the first results of witness sample based outgas resist family test to improve the efficiency of outgas testing using EUV resists that have shown proven imaging performance. The concept of resist family testing is to charact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b18fe0d24c707ba0c9a8c65282bd753
https://doi.org/10.1117/12.2087424
https://doi.org/10.1117/12.2087424
Autor:
Dominic Ashworth, Yu-Jen Fan, Ivan Pollentier, Yen-Chih Lin, Eishi Shiobara, Shinya Minegishi, Takeshi Sasami, Toru Fujimori, Charles S. Tarrio, Soichi Inoue, Shannon B. Hill, Isamu Takagi, Robert F. Berg, Yukiko Kikuchi, Thomas B. Lucatorto
Publikováno v:
SPIE Proceedings.
This paper reports on an all-out effort to reduce the intersite gap of the resist outgassing contamination growth in the results obtained under the round-robin scheme. All test sites collaborated to determine the causes of such gaps. First, it was de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3c8e3505ce79a55486a44533eaba2a5
https://doi.org/10.1117/12.2085700
https://doi.org/10.1117/12.2085700
Autor:
Chen-Shuan Chung, Chieh-Chang Chen, Kuan-Chih Chen, Yu-Jen Fang, Wen-Feng Hsu, Yen-Nien Chen, Wei-Chuang Tseng, Cheng-Kuan Lin, Tzong-Hsi Lee, Hsiu-Po Wang, Yen-Wen Wu
Publikováno v:
Scientific Reports, Vol 12, Iss 1, Pp 1-9 (2022)
Abstract Acute upper gastrointestinal bleeding (UGIB) in acute coronary syndrome (ACS) patients are not uncommon, particularly under dual antiplatelet therapy (DAPT). The efficiency and safety of early endoscopy (EE) for UGIB in these patients needs
Externí odkaz:
https://doaj.org/article/81665b6f61d24d8c8208494342c7a1ab
Autor:
Dominic Ashworth, Xibin Zhou, Patrick P. Naulleau, Yashesh Shroff, Greg Denbeaux, Yudhi Kandel, Ryan Miyakawa, Kevin Cummings, Yu-Jen Fan, Michael Goldstein
Publikováno v:
SPIE Proceedings.
We present an update of the AIS wavefront sensor, a diagnostic sensor set for insertion in the upgraded 0.5 NA SEMATECH Albany and Berkeley METs. AIS works by using offset monopole illumination to probe localized regions of the test optic pupil. Vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5e2f7d674539ff46f57368ca07b0e07
https://doi.org/10.1117/12.2048389
https://doi.org/10.1117/12.2048389