Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Yu, Liujiang"'
Autor:
Tang, Zhidong, Wang, Zewei, Yuan, Yumeng, He, Chang, Luo, Xin, Guo, Ao, Chen, Renhe, Hu, Yongqi, Yang, Longfei, Cao, Chengwei, Liu, Linlin, Yu, Liujiang, Shang, Ganbing, Cao, Yongfeng, Chen, Shoumian, Zhao, Yuhang, Hu, Shaojian, Kou, Xufeng
This paper outlines the establishment of a generic cryogenic CMOS database in which key electrical parameters and transfer characteristics of the MOSFETs are quantified as functions of device size, temperature/frequency responses. Meanwhile, comprehe
Externí odkaz:
http://arxiv.org/abs/2211.05309
Autor:
Wang, Zewei, Tang, Zhidong, Yuan, Yumeng, Guo, Ao, Luo, Xin, Chen, Renhe, Cao, Chengwei, Liu, Linlin, Zhi, Zhenghang, Wu, Weican, Guo, Yingjia, Hu, Yongqi, Yu, Liujiang, Shang, Ganbing, Chen, Jing, Tang, Jianshi, Hu, Shaojian, Chen, Shoumian, Zhao, Yuhang, Kou, Xufeng
The capability of data processing in quantum computers relies on the CMOS-based cryogenic control and storage systems. This paper outlines the establishment of the generic cryogenic CMOS database in which key electrical parameters and the transfer ch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3bd27af363f0859a15553be4854f290e
http://arxiv.org/abs/2211.05309
http://arxiv.org/abs/2211.05309
Akademický článek
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Autor:
Li, Rui, Wang, Jun, Sun, Zhenhai, Dong, Yaoqi, Kong, Weiran, Yu, Liujiang, He, Jun, Cheng, Xiaohua, Wang, Chingdong
Publikováno v:
In Microelectronic Engineering 2011 88(11):3270-3274
Publikováno v:
In Colloids and Surfaces B: Biointerfaces 2003 30(1):111-121
Autor:
Wang, Xianghui *, Liu, Xianghuai, Wang, Xi, Li, Changrong, Yu, Liujiang, Zhang, Feng, Zheng, Zhihong, Yang, Shiqi
Publikováno v:
In Surface & Coatings Technology 2002 158:563-567
Publikováno v:
International Journal of Computational Engineering Science. Sep2003, Vol. 4 Issue 3, p581-584. 4p. 3 Black and White Photographs, 5 Graphs.
Autor:
Jingxun Fang, Huijun Zhang, Fei Chen, Jianghua Leng, Huang Hai, Shirui Yu, Xubin Jing, Albert Pang, Long Zhao, Fang Li, Zhibiao Mao, Junhua Yan, Liang Zhang, Yu Zhang, Yu Liujiang, Cao Yongfeng, Yefang Zhu, Jun Huang
Publikováno v:
ECS Transactions. 52:625-633
This paper presents integration challenges associated with M1 to CT connection in Ultra low-k (ULK) Back-End-Of-Line (BEOL) interconnects for 40nm node and beyond. In advance IC fabrication, porous dielectric materials, such as BDII (related dielectr
Publikováno v:
Applied Surface Science. 223:286-293
Currently, there is a strong drive to make micro-electro-mechanical system (MEMS) devices from higher performance materials such as diamond-like carbon or amorphous carbon (a-C) films, due to their excellent tribological properties, low-stiction (hyd
Publikováno v:
Proceedings of SPIE; Nov2003, Issue 1, p549-557, 9p