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Autor:
Yozaburo Sakaki, Seigo Ohno, Kanta Kusaka, Hiroyuki Kurosawa, Kazuyuki Nakayama, Teruya Ishihara, Yuto Moritake
Publikováno v:
Optics express. 22(15)
We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region. Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask patterns for the