Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Youval Nehmadi"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 21:316-321
Advanced lithography optical proximity correction (OPC) techniques rely on accurately tuned process models. Although through-process OPC models are being used for critical layers at the 65-nm node, typically an initial model is created at a single op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8edfd2df282d0f0b0544aa11a1c8720c
https://doi.org/10.1109/tsm.2008.2001204
https://doi.org/10.1109/tsm.2008.2001204
Publikováno v:
International Journal of Bio-Medical Computing. 43:203-213
This article describes the application of Multi-Layer Perceptron (MLP), Probabilistic Neural Network and Kohonen's Learning Vector Quantization to the problem of diagnosing Multiple Sclerosis. The classification information is obtained from brainstem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1672264064a65b3ca46752eede3dfad1
https://doi.org/10.1016/s0020-7101(96)01211-1
https://doi.org/10.1016/s0020-7101(96)01211-1
Publikováno v:
2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
A new methodology is presented for identifying misprinted structures during the qualification of a new photomask. It is based on defect inspection of a focus- and exposure-modulated wafer. Instead of the traditional approach which employs repeater an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01c962ef74e48472f9655d13ec4217e8
https://doi.org/10.1109/asmc.2007.375104
https://doi.org/10.1109/asmc.2007.375104
Publikováno v:
2007 International Symposium on Semiconductor Manufacturing.
In this paper, we present a new methodology for inline yield prediction based on defect inspection and design data. We derive a new metric called criticality factor (CF), which is essentially a fractional critical area for a defect of the reported si
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::071185c69c9a555d6f1a6dbf9b5ff6f9
https://doi.org/10.1109/issm.2007.4446887
https://doi.org/10.1109/issm.2007.4446887
Autor:
Stefan Jank, Vlad Temchenko, Paul G Karakatsanis, Ramana Veerasingam, Rakesh Vallishayee, Christoph Dolainsky, Xiaojing Yang, Bong-Ryoul Choi, Youval Nehmadi, Moshe Poyastro
Publikováno v:
2006 IEEE International Symposium on Semiconductor Manufacturing.
Deploying OPC that is robust over the process window is becoming more and more challenging as geometries shrinki ii. This challenge has a major impact in time-to-market and yield of new products. This paper describes a litho simulator calibration flo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::56a01e026546abbce896b8fd6d594b4a
https://doi.org/10.1109/issm.2006.4493134
https://doi.org/10.1109/issm.2006.4493134
Autor:
Cesar Garza, Moshe Poyastro, Brian Troy, Jim Wiley, Al Reich, Joyce Zhao, Jim Vasek, Youval Nehmadi, Bill Wilkinson, Zamir Abraham
Publikováno v:
SPIE Proceedings.
One of the consequences of low-k 1 lithography is the discrepancy between the intended and the printed pattern, particularly in 2-D structures. Two recent technical developments offer new tools to improve manufacturing predictability, yield and contr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a0011fe13c4c76dc3c1f8565188839a
https://doi.org/10.1117/12.656856
https://doi.org/10.1117/12.656856
Autor:
Chen Ofek, Chris Haidinyak, Luigi Capodieci, Ariel Ben-Porath, Bhanwar Singh, Cyrus E. Tabery, O. Menadeva, M. Threefoot, B. Choo, Youval Nehmadi, K. Shah
Publikováno v:
SPIE Proceedings.
The procedure for properly implementing OPC for a new technology node or chip design involves multiple steps: selection of the RET (resolution enhance technique), selection of design rules, OPC Model Building, OPC Verification, CD control quantificat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59261bcb226b57277b009140bdcc72c3
https://doi.org/10.1117/12.601143
https://doi.org/10.1117/12.601143
Autor:
Hugo Guterman, Jean F. Soustiel, Moshe Feinsod, Youval Nehmadi, Andrei V. Chistyakov, Hava Hafner
Publikováno v:
International journal of medical informatics. 60(3)
In this study measurements obtained from brain-stem trigeminal evoked potentials (BTEP) are applied to the problem of diagnosing Multiple Sclerosis (MS) and Post-concussion syndrome (PCS). We present a simplistic model that depicts the BTEP waveform
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::be94fa3d7cb4e90e207e38777aa415f8
https://pubmed.ncbi.nlm.nih.gov/11137473
https://pubmed.ncbi.nlm.nih.gov/11137473
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