Výsledky vyhledávání - "Yousuke Goto"

Akademický článek

Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Autor: Hideo Horibe, Yousuke Goto

Publikováno v: International Journal of Polymer Science, Vol 2012 (2012)

We investigated the removal of polymers with various chemical structures and the removal of ion-implanted resists using wet ozone. The removal rates of polymers that have carbon-carbon (C–C) double bonds in the main chain were high. The main chain

Externí odkaz: https://doaj.org/article/9c2788abfc4d418ca578491f4e856141

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Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals

Autor: Takashi Nishiyama, Tatsuo Ishijima, Yu Arai, Yousuke Goto, Hideo Horibe, Seiji Takahashi, Masaru Hori, Kenji Ishikawa, Akihiko Kono, Masashi Yamamoto, Yusuke Noto

Publikováno v: Thin Solid Films. 575:12-16

The relationship between the chemical structure of PMMA-type polymers and the removal rate by hydrogen radicals was examined. Hydrogen radicals are known to have superior reduction ability and can be generated by decomposing H 2 on hot-wire surfaces.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a29d71dcedeec2c51e208b44ae86bea0
https://doi.org/10.1016/j.tsf.2014.10.021

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Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer

Autor: Akihiko Kono, Masaru Hori, Hideo Horibe, Yousuke Goto, Yu Arai, Masashi Yamamoto, Seiji Takahashi, Kenji Ishikawa, Tada-aki Yamagishi

Publikováno v: Thin Solid Films. 575:17-20

This paper discusses the decomposition processes of polymer thin films coated on silicon (Si) substrates by hydrogen radicals generated from H2 on hot-wire catalyst surfaces. N2 buffer was used to relax the translational motion of hydrogen radicals.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8059117d31bb7a943cd7d51e4ffdf514
https://doi.org/10.1016/j.tsf.2014.10.020

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High removal rate of cross-linked SU-8 resist using hydrogen radicals generated by tungsten hot-wire catalyzer

Autor: Hideo Horibe, Takashi Nishiyama, Seiji Takahashi, Yu Arai, Akihiko Kono, Masashi Yamamoto, Takeshi Maruoka, Yousuke Goto

Publikováno v: Thin Solid Films. 562:632-637

This paper discusses the removal of chemically amplified negative-tone i-line resist SU-8 using hydrogen radicals generated by the catalytic decomposition of H2 molecules in H2/N2 mixed gas (H2:N2 = 10:90 vol.%) using a tungsten hot-wire catalyzer. S

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0ff7e084029e089912c10bcd931115fa
https://doi.org/10.1016/j.tsf.2014.04.062

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Development of Ni particle dispersed poly(methylmethacrylate) composites exhibiting conductor/insulator transition by the positive temperature coefficient effect of electrical resistivity

Autor: Yousuke Goto, Seiji Takahashi, Masashi Yamamoto, Hajime Nakano, Akihiko Kono, Katsuya Shimizu, Toshiaki Ougizawa, Hideo Horibe

Publikováno v: Polymer Journal. 45:690-694

In this paper, we have provided the first conclusive evidence that the Ni particle dispersed poly(methylmethacrylate) (PMMA) composites, which do not exhibit melting phenomenon, exhibit the positive temperature coefficient (PTC) effect when Ni conten

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5da30030416d260fb446f5e27c25bddd
https://doi.org/10.1038/pj.2012.223

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Positive-temperature-coefficient effect of electrical resistivity below melting point of poly(vinylidene fluoride) (PVDF) in Ni particle-dispersed PVDF composites

Autor: Akihiko Kono, Yusuke Kobayashi, Hajime Nakano, Katsuya Shimizu, Hideo Horibe, Toshiaki Ougizawa, Yousuke Goto

Publikováno v: Polymer. 53:1760-1764

This paper discusses the positive-temperature-coefficient effects of resistivity in Ni particle-dispersed poly(vinylidene fluoride) (PVDF) composites based on experiment results from SEM, DSC, and pressure-volume-temperature (PVT) measurements. The m

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3eb19d7283ca7069d2c51f5c3602156
https://doi.org/10.1016/j.polymer.2012.02.048

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Ion-implanted resist removal using atomic hydrogen

Autor: Masashi Yamamoto, Hideo Horibe, Seiichi Tagawa, Takeshi Maruoka, Yousuke Goto, I. Nishiyama, Akihiko Kono

Publikováno v: Thin Solid Films. 519:4578-4581

We removed B-, P-, and As-ion-implanted positive-tone novolak resists with an implantation dose of 5 × 1012 to 5 × 1015 atoms/cm2 at 70 keV, using atomic hydrogen. Though the removal rate decreased with increase in the implantation dose, all of the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::268634f9e03622601ac30f9e9977fc0d
https://doi.org/10.1016/j.tsf.2011.01.287

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