Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Younsok Choi"'
Publikováno v:
Sensors, Vol 24, Iss 6, p 1786 (2024)
In this work, we propose our newly developed wafer-type plasma monitoring sensor based on a floating-type double probe method that can be useful for two-dimensional (2D) in situ plasma diagnosis within a semiconductor processing chamber. A key achiev
Externí odkaz:
https://doaj.org/article/8ee7ba5767af4c799cdb242066359267
