Zobrazeno 1 - 8
of 8
pro vyhledávání: '"YoungSun Nam"'
Publikováno v:
Journal of Dynamic Systems, Measurement, and Control. 140
We propose a novel modeling, estimation, and control framework for homogeneous charge compression ignition (HCCI) engines, which, by utilizing direct in-cylinder pressure sensing, can detect, and react to, the wide spectrum of combustion, thereby all
Autor:
Arjan Holscher, Jeong-Heung Kong, Samah Khalek, Chansam Chang, Elliot Oti, Jong Hoon Jang, Hyunwoo Hwang, Roelof de Graaf, Young Ha Kim, Jeroen Cottaar, Young Seog Kang, Stefan Weichselbaum, Marcel Raas, Richard Droste, Ralf Gommers, YoungSun Nam, ByeongSoo Lee, Bram van Hoof, Jan van Kemenade, Maarten Voncken
Publikováno v:
SPIE Proceedings.
ASML’s 300mm scanner-systems are built on the TWINSCAN (XT/NXT) platform and yield high productivity levels for dry as well as immersion litho-scanners. NXT:1980Di immersion scanners yield productivity levels as high as 275wph while maintaining the
Autor:
Stefan Weichselbaum, Joris Jongen, Se-Yeon Jang, Jang Jonghoon, Young Ha Kim, Jeong-Heung Kong, Niek Verbeek, Richard Droste, Bart Dinand Paarhuis, Roelof de Graaf, Young Seog Kang, YoungSun Nam, Jeroen van der Wielen, Byeong Soo Lee, Hyunwoo Hwang, Marco Koert Stavenga, Barry Moest
Publikováno v:
SPIE Proceedings.
Scanners in High-Volume-Manufacturing conditions will experience a large range of reticles that vary in reticle transmission and reticle diffraction characteristics. Especially under full production loads reticles will heat up due to the exposure lig
Intra-lot wafer by wafer overlay control using integrated and standalone metrology combined sampling
Autor:
YoungSun Nam, Dong Han Lee, Jae-Il Lee, Young Seog Kang, Se Yeon Jang, Young Sin Choi, Jeong Heung Kong
Publikováno v:
SPIE Proceedings.
As overlay margin is getting tighter, traditional overlay correction method is not enough to secure more overlay margin without extended correction potential on lithography tool. Timely, the lithography tool has a capability of wafer to wafer correct
Autor:
Ju Hee Shin, Eric Janda, Cedric Affentauschegg, Young-Seog Kang, Stefan Cornelis Theodorus Van Der Sanden, Young-Sin Choi, YoungSun Nam, Bernd Geh, Jang-Sun Kim, Jan Baselmans, Oh-Sung Kwon, Mariya Ponomarenko, Young Ha Kim, Hunhwan Ha, Rob W. van der Heijden, Daan Slotboom, Umar H. Rizvi
Publikováno v:
SPIE Proceedings.
In this paper we present the limitations of 3rd order distortion corrections based on standard overlay metrology and propose a new method to quantify and correct the cold-lens aberration fingerprint. As a result of continuous shrinking features of th
Autor:
Si Woo Shin, Hun Hwan Ha, Ju Hee Shin, Jeong Heung Kong, Young Sin Choi, Sangho Yun, Young-Hoon Kim, Young Seog Kang, Sunny Kim, YoungSun Nam
Publikováno v:
SPIE Proceedings.
To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern’s behavior, but also the larger measurement samples are inevitable for minimi
Autor:
Young Seog Kang, Ki-Yeop Park, Du Hyun Beak, Ki-Ho Baik, Chan-Hoon Park, Chang-Hoon Ryu, Jin Phil Choi, YoungSun Nam, Tony Park, Wenjin Huang
Publikováno v:
SPIE Proceedings.
We report that, based on our experimental data, lens heating (LH) impact on wafer image can be effectively controlled by using a computational method (cASCAL) on critical device layers with no request on tool time. As design rule shrinks down, LH con
Autor:
Jan Baselmans, Rob W. van der Heijden, YoungSun Nam, Bernd Geh, Oh-Sung Kwon, Hunhwan Ha, Jan Mulkens, Young Ha Kim, Cedric Affentauschegg, Umar H. Rizvi, Ju Hee Shin, Young Seog Kang, Jae-Il Lee, Young-Sin Choi, Jang-Sun S. Kim, Dong-han Lee
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:021403
As a result of the continuously shrinking features of the integrated circuit, the overlay budget requirements have become very demanding. Historically, overlay has been performed using metrology targets for process control, and most overlay enhanceme