Zobrazeno 1 - 10
of 14
pro vyhledávání: '"YoungJun Her"'
Autor:
Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Stefan De Gendt, Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson, YoungJun Her
Publikováno v:
Novel Patterning Technologies 2023.
Autor:
Masato Suzuki, YoungJin Kim, YoungJun Her, Hengpeng Wu, Kun Si, Mark Maturi, Philipp-Hans . Fackler, Mansour Moinpour, Ralph Dammel, Yi Cao
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
YoungJun Her, Huirong Yao, Munirathna Padmanaban, Kazuma Yamamoto, Douglas Mckenzie, Dalil Rahman, Takanori Kudo, Joonyeon Cho, Elizabeth Wolfer, Salem K. Mullen, Alberto D. Dioses, Yi Cao
Publikováno v:
Journal of Photopolymer Science and Technology. 27:503-509
Autor:
YoungJun Her, SungEun Hong, Claire Petermann, Douglas Mckenzie, Joonyeon Cho, Elizabeth Wolfer, Munirathna Padmanaban, Dalil Rahman, Huirong Yao, Salem K. Mullen
Publikováno v:
SPIE Proceedings.
Metal oxide or metal nitride films are used as hard mask materials in semiconductor industry for patterning purposes due to their excellent etch resistances against the plasma etches. Chemical vapor deposition (CVD) or atomic layer deposition (ALD) t
Autor:
Jan Doise, YoungJun Her, Germain Fenger, Julien Ryckaert, Joost Bekaert, Geert Vandenberghe, Roel Gronheid, Yi Cao
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
In recent years, major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCP). Insertion of DSA for IC fabrication is seriously considered for the 7 nm node. At this node the DSA technology could alleviate costs for
Autor:
Salem K. Mullen, Elizabeth Wolfer, Claire Petermann, Munirathna Padmanaban, YoungJun Her, Huirong Yao, Dalil Rahman, Yi Cao, Joonyeon Cho, Alberto D. Dioses, Douglas Mckenzie
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
It is well known that metal oxide films are useful as hard mask material in semiconductor industry for their excellent etch resistance against plasma etches. In the advanced lithography processes, in addition to good etch resistance, they also need t
Autor:
YoungJun Her, Guanyang Lin, Jihoon Kim, Lance Williamson, Roel Gronheid, Robert Seidel, Paul F. Nealey
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Directed self-assembly (DSA) of block copolymers (BCP) is attracting a growing amount of interest as a technique to expand traditional lithography beyond its current limits. It has recently been demonstrated that chemoepitaxy can be used to successfu
Autor:
Jianhui Shan, Tomohiko Tsutsumi, YoungJun Her, Yi Cao, Hengpeng Wu, Jian Yin, Jihoon Kim, Claire Petermann, Guanyang Lin
Publikováno v:
Alternative Lithographic Technologies VII.
Significant progresses on 300 mm wafer level DSA (Directed Self-Assembly) performance stability and pattern quality were demonstrated in recent years. DSA technology is now widely regarded as a leading complementary patterning technique for future no
Autor:
Vijaya-Kumar Murugesan Kuppuswamy, Geert Vandenberghe, Yi Cao, Boon Teik Chan, Joost Bekaert, Roel Gronheid, Jan Doise, YoungJun Her
Publikováno v:
SPIE Proceedings.
Directed Self Assembly (DSA) of Block Co-Polymers (BCP) has become an intense field of study as a potential patterning solution for future generation devices. The most critical challenges that need to be understood and controlled include pattern plac
Autor:
Munirathna Padmanaban, Joonyeon Cho, Huirong Yao, Hiroshi Yanagita, Takanori Kudo, Yi Cao, Shigemasa Nakasugi, YoungJun Her, Fumihiro Suzuki, Georg Pawlowski, Misumi Motoki, Jin Li, Ide Yasuaki
Publikováno v:
SPIE Proceedings.
Shot noise is a significant issue in EUV lithography, especially in printing small area features like contact holes. This brings about LCDU (Local CD Uniformity) issue and LCDU-sensitivity tradeoff. This paper describes efforts to alleviate this issu