Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Young-Wan Lim"'
Autor:
Kyu-Tae Sun, Jong-Mun Jeong, Kevin Ryan, Min-Suk Kim, Michiel Kupers, Paul Böcker, Jin-Moo Byun, Inez Sochal, Gwang-Gon Kim, Jung-Joon Suh, Milenko Jovanović, Hwa-Yeon Won, Lydia Vergaij-Huizer, Young-Wan Lim
Publikováno v:
SPIE Proceedings.
In order to optimize yield in DRAM semiconductor manufacturing for 2x nodes and beyond, the (processing induced) overlay fingerprint towards the edge of the wafer needs to be reduced. Traditionally, this is achieved by acquiring denser overlay metrol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1d04c1ec94e95a2b61c7ef6b42f7d67
https://doi.org/10.1117/12.2220459
https://doi.org/10.1117/12.2220459
Autor:
Jung-Joon Suh, Won-Kwang Ma, Kyu-Tae Sun, David Deckers, Honggoo Lee, Kevin Ryan, Jin-Moo Byun, Sangjun Han, Kou Weitian, Paul Böcker, Michiel Kupers, Noh-Jung Kwak, Young-Sik Kim, Young-Wan Lim, Gwang-Gon Kim, Elliott McNamara
Publikováno v:
SPIE Proceedings.
As DRAM semiconductor manufacturing approaches high volume for 1x nm nodes with immersion lithography, an increased emphasis is being placed on reducing the influence of the systematic wafer-level contribution to the on-product overlay budget. The co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e06bd49bcc0a5c6e360cdc737af6d44
https://doi.org/10.1117/12.2196879
https://doi.org/10.1117/12.2196879
Autor:
Thomas Theeuwes, Michael Kubis, Daan Slotboom, Young-Wan Lim, Kyu-Tae Sun, Sungki Park, Emil Schmitt-Weaver, Jens Staecker, Honggoo Lee, Min-Suk Kim, Won-Taik Kwon, Sangjun Han, Kevin Ryan, Myoung-Soo Kim
Publikováno v:
SPIE Proceedings.
While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning tech
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2141aac6a260fc40c54755c189ba52f
https://doi.org/10.1117/12.2085475
https://doi.org/10.1117/12.2085475
Publikováno v:
Journal of Korean Institute of Intelligent Systems. 14:617-622
In this work, we suggested the method which improves the efficiency of the face detection algorithm using Pulse-Coupled Neural Network. Face detection algorithm which uses the color information is independent on pose, size and obstruction of a face.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::540b042123025e41193507f3970dd618
https://doi.org/10.5391/jkiis.2004.14.5.617
https://doi.org/10.5391/jkiis.2004.14.5.617