Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Young-Kook Park"'
Publikováno v:
Electronics; Volume 11; Issue 9; Pages: 1324
Maintenance is the technology of continuously monitoring the conditions of equipment and predicting the timing of maintenance for equipment. Particularly in the field of semiconductor manufacturing, where processes are automated, various methods are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::09eeea5b3112b10a3eb7aef0cf44d4b9
https://doi.org/10.3390/electronics11091324
https://doi.org/10.3390/electronics11091324
Publikováno v:
Electronics; Volume 11; Issue 6; Pages: 863
High-definition (HD) maps determine the location of the vehicle under limited visibility based on the location information of safety signs detected by sensors. If a safety sign disappears or changes, incorrect information may be obtained. Thus, map d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::888f76e014afc9f0220e6d9db6d11825
https://doi.org/10.3390/electronics11060863
https://doi.org/10.3390/electronics11060863
Publikováno v:
Journal of Radiation Protection and Research. 43:160-169
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0ca257738402e8a82238a337d750cd2
https://doi.org/10.14407/jrpr.2018.43.4.160
https://doi.org/10.14407/jrpr.2018.43.4.160
Publikováno v:
Journal of IKEEE. 20:9-15
Theendpointdetection(EPD)isthemostimportanttechniqueinplasmaetchingprocess.Inplasmaetchingprocess,theOpticalEmissionSpectroscopy(OES)isusuallyusedtoanalyzeplasmareaction.AndPlasmaImpedanceMonitoring(PIM)systemisusedtomeasurethevoltage,current,power,a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc4164b95fd1ef16d028b306dd1c1868
https://doi.org/10.7471/ikeee.2016.20.1.009
https://doi.org/10.7471/ikeee.2016.20.1.009
Publikováno v:
Journal of IKEEE. 19:541-547
In current semiconductor manufacturing, as the feature size of integrated circuit (IC) devices continuously shrinks, detecting endpoint in plasma etching process is more difficult than before. For endpoint detection, various kinds of sensors are inst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93db8e2f343219bdc8c0b9f129d25fdb
https://doi.org/10.7471/ikeee.2015.19.4.541
https://doi.org/10.7471/ikeee.2015.19.4.541
Publikováno v:
Applied Mechanics and Materials. :1121-1126
In this paper, a linear quadratic Gaussian controller is proposed to achieve the robust temperature stability of the fuser system against measurement noise and system disturbance. The proposed controller is fitted to replace the PI controller and rel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::767a0310385a8ac3785cc1dcd4f5e385
https://doi.org/10.4028/www.scientific.net/amm.799-800.1121
https://doi.org/10.4028/www.scientific.net/amm.799-800.1121
Publikováno v:
ECS Transactions. 60:875-880
The need for the accurate endpoint detection (EPD) technique in plasma etching process is increasing in the semiconductor industry for yield improvement and higher device performance. To monitor and analyze plasma process, the one of the most popular
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c9338d6a4e9746c32bfe3ab745390d4
https://doi.org/10.1149/06001.0875ecst
https://doi.org/10.1149/06001.0875ecst
Publikováno v:
ECS Transactions. 52:847-852
In plasma etch process, the optical emission spectroscope (OES) is widely used to detect plasma etch endpoint. The OES gathers the intensity of the wavelength from the radicals in the plasma chamber. In addition, the OES is very sensitive to the exte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::056c7496d8c99e9ab4ff49d84a7d18a7
https://doi.org/10.1149/05201.0847ecst
https://doi.org/10.1149/05201.0847ecst
Publikováno v:
ECS Transactions. 52:907-912
As semiconductor devices are highly integrated, etching control is much more difficult in semiconductor industry. Plasma etching has better performance than wet etching especially in small open area etching. In semiconductor manufacturing industry, t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd3e4aceed2c51ef977a4193e2572a50
https://doi.org/10.1149/05201.0907ecst
https://doi.org/10.1149/05201.0907ecst
Publikováno v:
ECS Transactions. 44:1075-1080
Since semiconductor devices are extremely integrated, process control is much more difficult in semiconductor fabrication. The optical emission spectroscopy (OES) acquires unique wavelength intensity of particles in plasma chamber, and the endpoint c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e509834e0408208b3a055711d6ccd286
https://doi.org/10.1149/1.3694431
https://doi.org/10.1149/1.3694431