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pro vyhledávání: '"Young-Hui Yeh"'
Effect of Self-Biased Nitrous Oxide Plasma on Plasma-Enhanced Chemical-Vapor-Deposited Silicon Oxide
Publikováno v:
Japanese Journal of Applied Physics. 46:2887-2891
A new plasma treatment method was proposed to improve silicon oxide films. The improvement of the films was attributed to the introduction of oxygen atoms, which were extracted from self-biased nitrous oxide plasma. The introduced oxygen atoms decrea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b66c842b513f9f42a912869c3cd8aa50
https://doi.org/10.1143/jjap.46.2887
https://doi.org/10.1143/jjap.46.2887
