Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Youn‐Hye Kim"'
Autor:
Sang Eon Jun, Youn-Hye Kim, Jaehyun Kim, Woo Seok Cheon, Sungkyun Choi, Jinwook Yang, Hoonkee Park, Hyungsoo Lee, Sun Hwa Park, Ki Chang Kwon, Jooho Moon, Soo-Hyun Kim, Ho Won Jang
Publikováno v:
Nature Communications, Vol 14, Iss 1, Pp 1-11 (2023)
Single atom catalysts not only maximize the atomic efficiency of noble metal but also introduce unconventional geometric and electronic structures. Here, the authors demonstrate the decoration of iridium single atoms on silicon photoanodes to boost t
Externí odkaz:
https://doaj.org/article/bf1983ad65a846a68d56d2c4b33fbcca
Autor:
Debananda Mohapatra, Yujin Shin, Mohd Zahid Ansari, Youn‐Hye Kim, Ye Jin Park, Taehoon Cheon, Haekyoung Kim, Jung Woo Lee, Soo‐Hyun Kim
Publikováno v:
Advanced Science, Vol 10, Iss 12, Pp n/a-n/a (2023)
Abstract In searching for unique and unexplored 2D materials, the authors try to investigate for the very first time the use of delaminated V‐MXene coupled with precious metal ruthenium (Ru) through atomic layer deposition (ALD) for various contact
Externí odkaz:
https://doaj.org/article/15c56bc1e13e4c5088b351d4908565f0
Autor:
Yuki Mori, Taehoon Cheon, Yohei Kotsugi, Youn‐Hye Kim, Yejin Park, Mohd Zahid Ansari, Debananda Mohapatra, Yujin Jang, Jong‐Seong Bae, Woobin Kwon, Gahui Kim, Young‐Bae Park, Han‐Bo‐Ram Lee, Wooseok Song, Soo‐Hyun Kim
Publikováno v:
Small.
Autor:
Na-Yeon Park, Minsu Kim, Youn-Hye Kim, Rahul Ramesh, Dip K. Nandi, Tomohiro Tsugawa, Toshiyuki Shigetomi, Kazuharu Suzuki, Ryosuke Harada, Miso Kim, Ki-Seok An, Bonggeun Shong, Soo-Hyun Kim
Publikováno v:
Chemistry of Materials. 34:1533-1543
Publikováno v:
Journal of Materials Science: Materials in Electronics. 32:20559-20569
The effects of Mn addition and post-annealing on the interfacial decohesion energies of Ru direct plateable diffusion barrier layer prepared by atomic layer deposited (ALD) for advanced Cu interconnect applications were systematically evaluated using
Autor:
Dip K. Nandi, Seung-Min Han, Young-Bae Park, Taehoon Cheon, Youn-Hye Kim, Ryosuke Harada, Shigeyuki Ohtake, Bonggeun Shong, Kirak Son, Yohei Kotsugi, Neung-Kyung Yu, Rahul Ramesh, Tomohiro Tsugawa, Soo-Hyun Kim
Publikováno v:
Chemistry of Materials. 33:5639-5651
Autor:
Sang Eon Jun, Youn-Hye Kim, Jaehyun Kim, Woo Seok Cheon, Sungkyun Choi, Jin Wook Yang, Hoon Kee Park, Hyungsoo Lee, Sun Hwa Park, Ki Chang Kwon, Jooho Moon, Soo-Hyun Kim, Ho Won Jang
Stabilizing atomically dispersed single atoms (SAs) on Si photoanodes for photoelectrochemical-oxygen evolution reaction is still challenging due to the scarcity of anchoring sites. Here, we elaborately demonstrate the decoration of Ir SAs on Si phot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d54756d723e61dd495c77b14c412e9f3
https://doi.org/10.21203/rs.3.rs-1615417/v1
https://doi.org/10.21203/rs.3.rs-1615417/v1
Publikováno v:
2021 IEEE International Interconnect Technology Conference (IITC).
We report the ALD RuO 2 process using a new Ru metalorganic precursor, tricarbonyl (trimethylenemethane) ruthenium [Ru(TMM)(CO) 3 ], and molecular oxygen (O 2 ) as a reactant at the relatively low temperature of 180 °C for a diffusion barrier applic
Autor:
Youn‐Hye Kim, Minsu Kim, Yohei Kotsugi, Taehoon Cheon, Debananda Mohapatra, Yujin Jang, Jong‐Seong Bae, Tae Eun Hong, Rahul Ramesh, Ki‐Seok An, Soo‐Hyun Kim
Publikováno v:
Advanced Functional Materials. 32:2206667