Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Youbao Zhang"'
Publikováno v:
Applied Optics. 59:3476
This work provides an integrated design and simulation method for a pupil shaping unit, which combines optical design and simulation software using the Python programming language. The novel approach presented here allows for systematic optimization
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9dc84a0ca7ac3375797693bc94bc89f8
https://doi.org/10.1364/ao.385352
https://doi.org/10.1364/ao.385352
Publikováno v:
Optical Engineering. 59:1
As the critical dimensions of integrated circuits continue to grow smaller, overlay error is becoming increasingly important. Overlay error is mainly determined by the telecentricity of the exposure system in a photolithography tool. Existing telecen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f69f51680a24cb53734952d41aaf49c
https://doi.org/10.1117/1.oe.59.3.034109
https://doi.org/10.1117/1.oe.59.3.034109
Publikováno v:
SPIE Proceedings.
Pupil parameters are important parameters to evaluate the quality of lithography illumination system. In this paper, a cloud based full-featured pupil processing application is implemented. A web browser is used for the UI (User Interface), the webso
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c428a1569eff4a33451adfdea425876d
https://doi.org/10.1117/12.2266903
https://doi.org/10.1117/12.2266903
Publikováno v:
Acta Materialia. 60:5975-5983
Nd0.45Sr0.55MnO3 is an A-type antiferromagnetic manganite showing obvious angular-dependent magnetoresistance, which can be tuned by misfit strain. The misfit strain relaxation of Nd0.45Sr0.55MnO3 thin films is of both fundamental and technical impor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::266f135fbe5ec56149cad235a17c2511
https://doi.org/10.1016/j.actamat.2012.06.031
https://doi.org/10.1016/j.actamat.2012.06.031
Autor:
Huijie Huang, Lei Zhou, Yanfeng Yan, Lihua Huang, Zongmin Du, Jianfeng Qu, Ziwen Zhu, Zhaobiao Guo, Wenyan Hong, Zheng Yan, Ruifu Yang, Youbao Zhang, Haoran Wang, Chengke Xie
Publikováno v:
Journal of Microbiological Methods. 83:133-140
article i nfo Article history: In this study, a 10-channel up-converting phosphor technology-based lateral flow (TC-UPT-LF) assay was developed to profile antibodies against Yersinia pestis. Ten expressed Y. pestis proteins were covalently conjugated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e12c25f5bccf6b42b1f468fcaec73ffe
https://doi.org/10.1016/j.mimet.2010.08.005
https://doi.org/10.1016/j.mimet.2010.08.005
Publikováno v:
Optik. 121:1725-1728
Gold-labeled lateral flow (LF) assay has been studied extensively due to its sensitiveness, simpleness, and rapidness. In this paper, scattering properties of nanogold particles and LF strip were analyzed. Based on the above analysis, a reflectance p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1ecdc657cd4b73c86c275dd299ef444
https://doi.org/10.1016/j.ijleo.2009.04.004
https://doi.org/10.1016/j.ijleo.2009.04.004
Publikováno v:
Philosophical Magazine Letters. 90:323-336
Charge-ordered Pr0.5Ca0.5MnO3 (PCMO) thin films epitaxially grown on SrTiO3 (100) substrates were prepared by a two-step growth technique which resulted in a 10 nm thick first layer and a 70 nm thick main layer. The dislocations in the as-received fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e2290f932323efdf9d941c5d690c582
https://doi.org/10.1080/09500831003662503
https://doi.org/10.1080/09500831003662503
Autor:
Lei Zhou, Jianfeng Qu, Xiangzhao Wang, Huijie Huang, Youbao Zhang, Ruifu Yang, Aijun Zeng, Lihua Huang, Chengke Xie
Publikováno v:
IEEE Sensors Journal. 9:1185-1191
A simple optical reader was developed for rapid and sensitive quantification of lateral flow (LF) strip with upconverting phosphor (UCP) particles as reporters. The excitation beam from a 980 nm laser diode (LD) was focused to a 4 mm (length) times 0
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5d4ac6680fd02d543f21afa317fbcf43
https://doi.org/10.1109/jsen.2009.2027416
https://doi.org/10.1109/jsen.2009.2027416
Publikováno v:
SPIE Proceedings.
Illumination uniformity of the illuminator is significant for achieving stringent critical dimension (CD) control for lithography machine. In order to achieve high uniform illuminating, there is an urgent demand of accurate measurement for illuminati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b30e89fa0fa2c92dc15d039b6eeef83e
https://doi.org/10.1117/12.2192536
https://doi.org/10.1117/12.2192536
Publikováno v:
Proceedings of SPIE; 1/26/2017, Vol. 10250, p1-5, 5p