Zobrazeno 1 - 10 of 10 pro vyhledávání: '"Yoshitsugu Tsutsumi"'
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Autor: Satoshi KUROKOUCHI, Masayuki OKABE, Mitsuyoshi SAITO, Shinsaku MORITA, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Seiichiro KANNO, Tatehito USUI, Koichi SUDOH, Tatsuo YOSHINOBU, Hiroshi IWASAKI, Hiroaki TANAKA, Kimio OKUNO, Tadao MIURA, Touru SUMIYA, Katsuya HONDA, Shun-ichiro TANAKA, Yukio INOKUTI, Kazuhiro SUZUKI, Nastuki TAKAHASHI, Osamu OHKUBO, Yoshihiro SAWAHIRA, Akishige SATO, Naoto KIKUCHI, Eiji KUSANO, Hidehito NANTO, Akira KINBARA, Tetsuya NARUSHIMA, Akiko ITAKURA, Takaya KAWABE, Masahiro KITAJIMA, Masaru KITAGAWA, Toshiyuki OHYA, Hiroyuki NAGAHAMA, Sei-ichiroh YOKOYAMA, Ichiro ARAKAWA, Takashi ADACHI, Takato HIRAYAMA, Koichiro MITSUKE, Makoto SAKURAI, Sin-ichi IGARASHI, Yukiko ABE, Yasuo IRIE, Miyuki KAMBE, Aki TOSAKA, Satoko HAMAMATSU, Satoshi ISHII, Yoshiyuki NORIMITSU, Toshimi SUTOU, Noriyuki UBUKATA, Yoshihiro OINUMA, Shigeru SAITO, Masaaki KATOH, Kenichi TAJIMA, Daisuke HORIMOTO, Takeo OHTE, Akira KOJIMA, Seiya OHI, Takashi SHIOYA, Kazuhiko KOBAYASHI, Hidefumi NAKAJIMA, Satoshi YOKOYAMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Koichiro UCHIMURA, Hitoshi TABATA, Tomoji KAWAI, Yutaka HIBINO, Guochun XU, Yasuo SUZUKI, Masao TANIHARA, Yukio IMANISHI, Shigemi SUGINUMA, Masahiro HIRATA, Hitoshi AKIMICHI, Kyoko TAKEUCHI, Yutaka TUZI, Masahiro TOSA, Akira KASAHARA, Kyung Sub LEE, Kazuhiro YOSHIHARA, Tomonari TANAKA, Tadashi SAWADA, Wataru SUGIYAMA, Koyu OTA, Daisuke YAMAUCHI, Shinobu SATO, Masatoshi TANAKA, Masaaki KISHIDA, Masahiko TOMITORI, Kiyotaka ASAKURA, Wang-Jae CHUN, Yasuhiro IWASAWA, Kiminori KAKITANI, Hiroko KAJI, Yoichiro YAGI, Akio YOSHIMORI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Shigeaki NAKAMURA, Nobuo SAITO, Shoji YOSHIOKA, Isamu NAKAAKI, Hideo HASEGAWA, Toshiyuki MIHARA, Shoichi MOCHIZUKI, Shigeharu TAMURA, Hironori KOBAYASHI, Ryoji MAKABE, Tadashi ISHIDA, Yoshiyuki SATO, Masanori ANDO, Tetsuhiko KOBAYASHI, Ayako HIOKI, Kazuki NATSUKAWA, Koji INOUE, Yoshikazu NAKAYAMA, Takayuki SATO, Shinichiro MICHIZONO, Yoshio SAITO, Shinichi KOBAYASHI, Kiyohide KOKUBUN, Yuuki WATANABE, Heizo TOKUTAKA, Kikuo FUJIMURA, Tatsuo SHIMIZU, Yasushiro NISHIOKA, Hideki TANAKA, Hiroyuki WAKIMOTO, Toshihiko MIYAZAKI, Goro MIZUTANI, Sukekatsu USHIODA, Yoshitake YAMAGUCHI, Satoru TAKAKUSAGI, Makoto KATO, Yuji SAKAI, Akira KUROKAWA, Shingo ICHIMURA, Ken NAKAMURA, Takanori AOKI, Syogo TODA, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Kazuaki HAMAJI, Yoshiharu KAKEHI, Tsutom YOTSUYA, Norihiro MATSUOKA, Yoshitsugu TSUTSUMI, Hideki TOMIOKA, Yoshio OKAMOTO, Kensuke MURAI, Masato YASUMOTO, Norimasa UMESAKI, Hirohiko NAKANO, Toshiaki TATSUTA, Jiro MATSUO, Isao YAMADA, Hiroyuki MAGARA, Osamu TABATA, Touichi HATANO, Masatoshi KOTERA, Kiyoshi YAMAGUCHI, Naohiro HORII, Kunio OKIMURA, Akira SHIBATA, Hiroshi MURAKAMI, Ikuya KAMEYAMA, Satoru SUKENOBU, Kazuhiko MIMOTO, Takashi MATSUMOTO, Takafumi YOSHIKAWA, Masato KIUCHI, Seiichi GOTO, Masatoshi OHBA, Yoshiaki AGAWA, Kazuma SHIBUTANI, Hiroshi TSUJI, Yasuhito GOTOH, Junzo ISHIKAWA, Hiroki KAWADA, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masanori KATSUYAMA, Shinichi SUZUKI, Katsuto TANAHASHI, Yuichi KAWAMURA, Naohisa INOUE, Yoshikazu HOMMA, Michimasa KIKUCHI, Kazumasa ISHIKAWA, Teiichi HOMMA, Yoshinori SUGANUMA, Nan LI, Katsuyoshi KOBAYASHI, Nobuyoshi SAKAKIBARA, Yoshiki UENO, Masayuki AOKI, Toshiaki YASUI, Keito MORIMOTO, Hirokazu TAHARA, Takao YOSHIKAWA, Hidekazu KODERA, Masahiko UOTA, Yoshihiro SATOH, Tomio KUBO, Kozo MOCHIJI, Naoshi ITABASHI, Hiroshi SHIMIZU, Shunsuke OHTANI, Kazuhiko OKUNO, Nobuo KOBAYASHI
Publikováno v: SHINKU. 42:417-495
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e06a27fd4675b04c3a233a96939266ab
https://doi.org/10.3131/jvsj.42.417
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3
Basic Performance of the New Vaporizer Using Direct Injection for Liquid Sources to Deposite Thin Film
Autor: Yoshio Okamoto, Hideki Tomioka, Yoshitsugu Tsutsumi
Publikováno v: SHINKU. 42:923-928
With regard to semicondutors, thin films that are manufactured for DRAM (Dynamic Random Access Memory) capacitors with high dielectric constant will be used for 256M-or 1G-DRAMs. Sources of these thin films are in liquid phase at normal condition. In
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4a947b03117442e67a107ba011cf8bc3
https://doi.org/10.3131/jvsj.42.923
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4
Molecular Beam Sampling to Analyze the Reaction Mechanism of Chemical Vapor Deposition
Autor: Kazunori Watanabe, Kobayashi Junichi, Yoko Ichikawa, Masato Ikegawa, Tatehiko Usui, Yoshitsugu Tsutsumi
Publikováno v: SHINKU. 40:353-359
In order to understand the chemical vapor deposition (CVD) reaction mechanism, forming a thin film from the gas phase, it is important to identify the intermediate chemical active species (radicals) for each reaction. Radicals generally have very sho
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::182a5538889d2d4dbe6c1200c61fb32e
https://doi.org/10.3131/jvsj.40.353
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