Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Yoshiomi Hiroi"'
Autor:
Kohei Suzuki, Yoshiomi Hiroi, Natsuki Abe-Fukasawa, Taito Nishino, Takeaki Shouji, Junko Katayama, Tatsuto Kageyama, Junji Fukuda
Publikováno v:
Scientific Reports, Vol 12, Iss 1, Pp 1-11 (2022)
Abstract Repellent coatings are critical for the development of biomedical and analytical devices to prevent nonspecific protein and cell adhesion. In this study, prevelex (polyampholytes containing phosphate and amine units) was synthesized for the
Externí odkaz:
https://doaj.org/article/b16862a39f4048a48f1376c05b702d95
Autor:
Kohei Suzuki, Yoshiomi Hiroi, Natsuki Abe-Fukasawa, Taito Nishino, Takeaki Shouji, Junko Katayama, Tatsuto Kageyama, Junji Fukuda
Publikováno v:
Scientific reports. 12(1)
Repellent coatings are critical for the development of biomedical and analytical devices to prevent nonspecific protein and cell adhesion. In this study, prevelex (polyampholytes containing phosphate and amine units) was synthesized for the fine coat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9518b6f2bd5a446719978437633a36aa
https://pubmed.ncbi.nlm.nih.gov/35752647
https://pubmed.ncbi.nlm.nih.gov/35752647
Autor:
Salama Ramy, Yuki Ueda, Tetsuo Torisu, Hiroyuki Nakajima, Susumu Uchiyama, Hiroi Miya, Yoshiomi Hiroi
Publikováno v:
Journal of pharmaceutical sciences. 111(3)
Recombinant adeno-associated virus (rAAV) vectors have proven efficacy as gene therapy vehicles. However, non-specific adsorption of these vectors on solid surfaces is encountered during production, storage, and administration, as well as in quantifi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d51e3190b02597a6e0e99e834fcbd58
https://pubmed.ncbi.nlm.nih.gov/34706282
https://pubmed.ncbi.nlm.nih.gov/34706282
Autor:
Masakazu Kato, Shigeo Kimura, Daisuke Maruyama, Bang-Ching Ho, Rikimaru Sakamoto, Tomohisa Ishida, Noriaki Fujitani, Ryuji Onishi, Yoshiomi Hiroi, Endo Takafumi
Publikováno v:
ECS Transactions. 27:479-487
Double patterning process with ArF immersion lithography has been developed as one of the most promising candidate for hp32 node and beyond. However complicated process flow and cost of ownership are the critical issue for this process. LELE (Litho-E
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::84dd5f289f3e23ac6528833a5e427d27
https://doi.org/10.1149/1.3360663
https://doi.org/10.1149/1.3360663
Publikováno v:
SPIE Proceedings.
The lithography process for implant layer will be more difficult beyond 22nm node. Current method, TARC/ resist stacks, resist/ DBARC stacks and resist/ BARC with etching process, can't meet manufacture requirement. How to solve this issue will be ve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd47fe972ea69e980312978f92258673
https://doi.org/10.1117/12.916132
https://doi.org/10.1117/12.916132
Autor:
Tomohisa Ishida, Yoshiomi Hiroi, Masakazu Kato, Daisuke Maruyama, Ryuji Onishi, Bang-Ching Ho, Endo Takafumi, Rikimaru Sakamoto, Shigeo Kimura, Noriaki Fujitani
Publikováno v:
SPIE Proceedings.
Double patterning process with ArF immersion lithography has been developed as one of the most promising candidate for hp32 node and beyond. However the complicated process flow and cost of ownership are the critical issue for this process. LELE (Lit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::efe2a25623c89a6732ec23117d32eb19
https://doi.org/10.1117/12.846012
https://doi.org/10.1117/12.846012
Autor:
Yoshiomi Hiroi, Haruyuki Okamura, Noriaki Majima, Masamitsu Shirai, Shigeo Kimura, Yasuyuki Nakajima
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
In chemically amplified (CA) resist process, photo-chemically generated acid is needed to diffuse in resist matrix to induce the de-blocking reaction. The concentration of acid in resist matrix should be constant during the post-exposure-bake (PEB) t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34da76abbb5b77a873fd1cc44bf96105
https://doi.org/10.1117/12.813379
https://doi.org/10.1117/12.813379
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
The pattern shrinkage of semiconductor devices has been achieved by moving to shorter and shorter wavelengths in the optical lithography technologies. According to the ITRS, it is estimated that this trend will be continued through advanced lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f427af7f02b6513e0495aa44c7e63a23
https://doi.org/10.1117/12.772103
https://doi.org/10.1117/12.772103
Autor:
Yoshiomi Hiroi, Takashi Matsumoto, Rikimaru Sakamoto, Sangwoong Yoon, Young-Ho Kim, Sang-Mun Chon, Daisuke Maruyama, Seok Jin Han, Young-Hoon Kim, Yasushi Sakaida, Yasuyuki Nakajima, EunYoung Yoon, Takahiro Kishioka
Publikováno v:
SPIE Proceedings.
We found a new polymer platform for ArF BARC that can be prepared by addition polymerization. This system not only improves resist pattern collapse, but also allows control of the optimum film thickness, and etch rate by combination of compounds, met
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19ff2498295652027cb303df1156d146
https://doi.org/10.1117/12.599421
https://doi.org/10.1117/12.599421
Publikováno v:
Journal of Photopolymer Science and Technology. 20:827-828
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1aa9838e5fa881ad57f46f03cfa099b4
https://doi.org/10.2494/photopolymer.20.827
https://doi.org/10.2494/photopolymer.20.827